High-frequency ion source

• US 5,017,835 A
• Filed: 11/20/1989
• Issued: 05/21/1991
• Est. Priority Date: 03/18/1987
• Status: Expired due to Term

• Current Assignee: Hans Oechsner
• Original Assignee: Hans Oechsner
• Inventors: Oechsner, Hans
• Primary Examiner(s): LaRoche, Eugene R.
• Assistant Examiner(s): YOO, DO H
• Application Number:
  US07/415,259
• Time in Patent Office: 547 Days
• Field of Search: 315/111.21, 315/111.31, 315/111.41, 315/111.51, 315/111.81, 315/248, 313/231.31, 333/32, 250/423 R
• US Class Current: 315/111.81
• CPC Class Codes: H01J 27/18 with an applied axial magnetic field
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns

Abstract

A high-frequency ion source for the production of an ion beam using electron cyclotron resonance has a tubular vessel whose shape matches the desired shape of the beam. The vessel, which is designed to accommodate an ionizable gas, is surrounded by a coil, and the coil is coupled to a high-frequency generator via a resonant circuit. A Helmholtz coil pair matched to the shape of the vessel is arranged to generate a magnetic field which is directed normal to the axis of the coil surrounding the vessel. The vessel is clamped between two plates and one of the plates contains a system for extracting ions from the vessel. The extraction system includes a plurality of spaced electrodes which function to attract and accelerate ions. The electrodes are formed with slotted openings which shape a stream of ions flowing out of the vessel into the form of a flat beam. An additional electrode can be provided to suppress the escape of electrons from the beam back into the vessel.

Claims

1. High-frequency ion source for the generation of large-area ion beams, the ion source having a vessel for substances, particularly gases, to be ionized, high-frequency energy being capable of being inductively coupled into a plasma and a d.c. magnetic field being superimposed on the plasma, characterized in that a plasma excitation at gas pressures in a high-vacuum can be carried out in a tubular plasma vessel (1) by electron cyclotron waves which are resonant with respect to the dimensions of the plasma vessel, the plasma vessel (1) being matched to the shape of the desired ion beam and being clamped between a carrier plate (7) and a closure plate (8), and an intermediate circuit (5) capable of being resonated being arranged between a high-frequency generator (4) and a load circuit coil (2), a weak, d.c. magnetic field, which is directed perpendicular to the axis of the load circuit coil (2) based on the theory of electron cyclotron wave resonance and has a magnitude given by the theory, being generated by a Helmholtz coil pair (6) whose geometric configuration is matched to the shape of the plasma vessel (1), and an ion-optical system for ion extraction (9), consisting of a plurality of electrodes and matched to the geometry of the desired ion beam, being arranged in the carrier plate (7).

2. High-frequency ion source according to claim 1, characterized in that a first and a second extraction electrode (E₁, E₂) are provided as the system for ion extraction (9), a voltage (U₂) serving as a potential step for the separation of subsequently ionized, injected foreign particles from the plasma ions being capable of being applied to the extraction electrodes (E₁, E₂), and additional electrodes (E₃, E₄, . . . E_n) with applied ion-accelerating voltages (U₃, U₄, . . . U_n), and a suppression electrode (E_s) with a suppression voltage (U_s), being provided.

3. High-frequency ion source according to claim 2, characterized in that the first extraction electrode (E₁) is made of non-conductive material and the voltages (U₃ . . . U_n) of the additional electrodes are applied to the second extraction electrode (E₂).

4. High-frequency ion source according to claim 1, characterized in that the plasma vessel (1) is parallelepipedal with rounded sides and open end faces and the system for ion extraction (9) has slit-shaped electrodes (E₁ . . . E_n, E_s).

5. High-frequency ion source according to claim 1, characterized in that an atomization target (10) is arranged on the closure plate (8).

6. High-frequency ion source according to claim 1, characterized in that the closure plate (8) is connected, via openings (11), with a vacuum vessel (12) containing resistance or electron beam vaporizers (13).