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Pattern comparator with substage illumination and polygonal data representation

  • US 5,018,210 A
  • Filed: 03/25/1988
  • Issued: 05/21/1991
  • Est. Priority Date: 03/25/1988
  • Status: Expired due to Term
First Claim
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1. A pattern inspection system for inspecting an opaque pattern on a transparent target, comprising:

  • a database partitioned into frames of data describing an ideal pattern comprised of reference polygons, wherein each reference polygon is contained within one frame;

    a plurality of pipelines for expanding the frames of data into bit-mapped descriptions of the polygons;

    a light source below the target for illuminating the non-patterned areas of the target;

    a photo-detector for raster scanning the target;

    a clock for clocking in pixel data from the photo-detector; and

    a comparator for comparing the pixel data with the bit-mapped descriptions of the polygons.

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