Substrate handling and transporting apparatus
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Abstract
A substrate loading subsystem receives substrates from an external source and delivers them to an input port. A substrate pickup transports the substrates serially from the input port to a delivery port of a processing subsystem wherein the substrates are subjected to a reactant gas in a reaction chamber. After completion of the chemical vapor deposition, the substrate pick up serially transports the substrates to an outlet port wherefrom they are off loaded.
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Current AssigneeASM America Incorporated (ASM International NV)
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Original AssigneeEpsilon Technology Incorporated (ASM International NV)
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InventorsGoodwin, Dennis L., Hawkins, Mark R., Crabb, Richard, Robinson, McDonald, Ferro, Armand P.
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Primary Examiner(s)BUEKER, RICHARD R
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Application NumberUS07/315,723Time in Patent Office830 DaysField of Search414/217, 414/225, 118/719US Class Current118/719CPC Class CodesC30B 25/10 Heating of the reaction cha...C30B 29/06 Silicon
