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Wavefront sensing and correction with deformable mirror

  • US 5,026,977 A
  • Filed: 06/15/1990
  • Issued: 06/25/1991
  • Est. Priority Date: 04/05/1989
  • Status: Expired due to Term
First Claim
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1. A system for determining the radiation transmission characteristics of a region along a reference axis comprising:

  • A. means for generating a first substantially single frequency radiation beam along a first axis said first radiation beam being characterized by a wavelength g;

    B. beamsplitter including means for splitting said first beam into a second beam and a third beam, means for directing said second beam along a second axis, and means for directing said third beam along a third axis, wherein one of said directed second and third beams at least in part propagates through said region;

    C. a first reflector fixedly positioned along said second axis and including means for reflecting said second beam incident thereon back along said second axis;

    D. a second reflector including a reflective surface on a piezoelectrically active support, said second reflector being positioned along said third axis for reflecting said third beam incident thereon back along said third axis;

    E. charge deposition means for depositing a distribution of charge on the piezoelectrically active support to deform the support and thus the reflective surface in a range extending along said third axis between a first reference point and a second reference point on said third axis;

    F. means for establishing a fourth beam and directing said fourth beam along a fourth axis, said fourth beam being a combination of said reflected second and third beams;

    G. an array of radiation detectors positioned along and extending transverse to said fourth axis and including means responsive to portions of said fourth beam incident thereon for generating intensity signals, each of said intensity signals being representative of the intensity of the portion of said fourth beam incident on an associated detector of said array; and

    H. processing means responsive to said intensity signals for generating control signals which are provided to the charge deposition means to control the distribution of charge such that said fourth beam has a substantially uniform intensity at said array of radiation detectors.

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