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Method for fabricating a channel device and tube connection

  • US 5,027,499 A
  • Filed: 04/21/1989
  • Issued: 07/02/1991
  • Est. Priority Date: 12/09/1985
  • Status: Expired due to Fees
First Claim
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1. A method for manufacturing a device for measuring at least one characteristic of a fluid by passing such fluid through a measuring channel of appropriate dimensions for measuring such characteristic;

  • said method comprising the steps of;

    providing a support member having an inlet orifice and an outlet orifice;

    depositing a channel-forming dissolvable material on the support member in a path which spans between the inlet and outlet orifices;

    controlling the shape of the path of dissolvable material to obtain a measuring channel having appropriate dimensions for measuring said one characteristic of the fluid;

    forming a wall by depositing a wall-forming material onto the support member and onto and around the path of passage-forming dissolvable material by a process selected from a group consisting of evaporation, spin on, drop on, sputtering, and reactive deposition, whereby a wall is formed which substantially covers the path of channel-forming dissolvable material and which covers at least parts of the support member;

    dissolving and removing the path of channel-forming dissolvable material through at least one of said orifices by introducing a solvent which dissolves the path of dissolvable material but which does not interact with the support member and the wall, whereby a measuring channel of appropriate dimensions is formed which spans between the inlet orifice and the outlet orifice, whereby inner surfaces of the support member and the wall define the measuring channel and whereby the support member and wall form a housing surrounding the measuring channel; and

    providing at least one sensor for measuring at least one characteristic of such fluid as it passes through the measuring channel by attaching and arranging the sensor in a sensing position relative to the housing by a process which is a member of a group consisting of evaporation, spin on, drop on, sputtering, reactive deposition, chemical vapor deposition, plasma enhanced chemical vapor deposition, and ion implantation whereby the housing and sensor form a sensor-housing unit.

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