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Apparatus with layered microwave window used in microwave plasma chemical vapor deposition process

  • US 5,038,712 A
  • Filed: 12/18/1989
  • Issued: 08/13/1991
  • Est. Priority Date: 09/09/1986
  • Status: Expired due to Term
First Claim
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1. In an apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process comprising a substantially enclosed deposition chamber which is provided with a substrate supporting means, a raw material gas feeding means, an exhaust means and a window allowing transmission of microwaves from a microwave power source as a constituent wall member of the deposition chamber, the improvement which comprises a plurality of layers laminated concentrically in the center of the window and in the direction of microwave transmission, each of said layers comprising a microwave transmissible material having a specific inductive capacity of more than 1.0, whereby the laminated window acts as a microwave resonator and provides enhanced microwave transmission.

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