Method and apparatus for cleaning surfaces to absolute or near-absolute cleanliness

• US 5,039,349 A
• Filed: 05/18/1990
• Issued: 08/13/1991
• Est. Priority Date: 05/18/1990
• Status: Expired due to Term

• Current Assignee: Parker Intangibles LLC (Parker-Hannifin Corporation)
• Original Assignee: Veriflo Corp. (Parker-Hannifin Corporation)
• Inventors: Schoeppel, John F.
• Primary Examiner(s): Morris, Theodore
• Assistant Examiner(s): CHAUDHRY, SAEED T
• Application Number:
  US07/524,985
• Time in Patent Office: 452 Days
• Field of Search: 134/10, 134/26, 134/30, 134/95, 134/98, 134/108, 134/111
• US Class Current: 134/26
• CPC Class Codes: B08B 3/02 Cleaning by the force of jets or sprays
• CPC Class Codes: H01L 21/67028 for cleaning followed by drying, rinsing, stripping, blasting or the like

Abstract

A method and apparatus for cleaning surfaces to absolute or near-absolute cleanliness involves spraying jets of heated cleaning solution so that it flows over and scrubs the surfaces to be cleaned. The cleaning solution is continuously recirculated and filtered during cleaning to remove over 99% of all particles having a diameter equal to or greater than 0.02μ. The cleaned surface is rinsed with heated, filtered deionized water and dried to provide a surface having absolute or nearly-absolute cleanliness to the limit of the best commercial instrumentation, e.g., ≦ five particles with a diameter of ≧0.02μ per cubic foot of gas flowed over a cleaned surface as detected by a laser particle counter. The method is useful for cleaning gas valves and regulators and components thereof as well as existing gas flow equipment, for example, for use in semiconductor processing equipment. The cleaned surfaces are sterile and therefore also useful in the health and pharmaceutical industries.

Claims

1. A method of cleaning a surface to absolute or near-absolute cleanliness such that when dry nitrogen is filtered through a 0.01 μ

filter, passed over the cleaned, dried surface and through a laser particle counter, the laser particle counter will detect less than five particles having a diameter ≧

0.1 μ

per cubic foot of gas flow, a condensation nucleating counter will detect no more than five particles having a diameter of 0.02 μ

or larger, and wherein residual surface ions and residual surface organics, if any, are present in a concentration of less than one part per million, said method comprising contacting a surface of a member to be cleaned with jets of a cleaning solution which impinge on the surface at high speed and flow over the surface so as to create a scrubbing action on the surface and flowing a rinse liquid in contact with the surface to be cleaned to rinse the surface, wherein the rinse liquid is recirculated into contact with the surface during said rinsing, the recirculating rinse liquid being filtered during recirculation to remove all particles having a diameter equal to or greater than 0.2 μ

.

2. A method according to claim 1, wherein the rinse liquid is filtered to remove over 99% of particles having a diameter equal to greater than 0.02 μ

.

3. A method according to claim 1, wherein the rinse liquid is recirculated into contact with the cleaned surface multiple times during said rinsing and is filtered each time it is recirculated.

4. A method according to claim 1, wherein the rinsing liquid is de-ionized water.

5. A method according to claim 4, wherein the de-ionized rinse water has a resistance between 17 and 18 megohm-cm.

6. A method according to claim 4, further comprising the step of heating the de-ionized rinse water to a temperature of at least 60°

C. before flowing it in contact with the cleaned surface.

7. A method according to claim 6, wherein the de-ionized rinse water is heated to at least about 85°

C., and its resistance is ≧

17 megohm-cm, measured at 25°

C.

8. A method according to claim 1, including flowing the rinse liquid in contact with the surface at a speed of ≧

60 mph.

9. A method according to claim 1, wherein the recirculating rinse liquid is filtered immediately prior to contacting said surface, and downstream of pump means for recirculating the rinse liquid.

10. A method according to claim 1, further comprising the step of drying the rinsed surface, said drying step including blowing the surface free of surface water with dry, filtered nitrogen gas.

11. A method according to claim 1, wherein said rinsing step further includes rinsing the surface in a rinse liquid which is not recirculated before the rinsing surface in the rinse liquid which is recirculated.

12. A method according to claim 1, wherein the member is a gas flow regulating device or a component thereof.

13. A method according to claim 1, wherein prior to contacting the surface with the cleaning solution the member is subjected to a preliminary, solvent cleaning, and is electroplated and passivated.

14. A method according to claim 1, wherein the surface to be cleaned is formed of a stainless material.

15. A method according to claim 1, wherein the cleaning solution is recirculated into contact with said surface, the recirculated cleaning solution being filtered during recirculation to remove all particles having a diameter ≧

0.2 μ

.

16. A method according to claim 15, wherein the cleaning solution is recirculated into contact with the surface multiple times and is filtered each time it is recirculated to remove over 99% of particles having a diameter ≧

0.02 μ

.

17. A method according to claim 15, including heating the cleaning solution before contacting the surface to be cleaned with said cleaning solution.

18. A method according to claim 15, wherein the cleaning solution is flowed into contact with the surface to be cleaned at speeds ≧

60 mph.

19. A method according to claim 1, further comprising drying the rinsed surface of the member to provide a surface which is at least nearly absolutely clean.

20. A method according to claim 19, further comprising assembling the member with the at least nearly absolutely clean surface into a gas flow equipment whereby the surface is contaminated such that it is no longer nearly absolutely clean, and recleaning the surface to a condition of at least nearly absolute cleanliness by flowing gas over said surface in said gas flow equipment to sweep the contamination from said surface.

21. An apparatus for cleaning a surface to absolute or near-absolute cleanliness such that when dry nitrogen is filtered through a 0.01 μ

filter, passed over the cleaned, dried surface and through a laser particle counter, the laser particle counter will detect less than five particles having a diameter ≧

0.1μ

per cubic foot of gas flow, a condensation nucleating counter will detect no more than five particles having a diameter of 0.02 μ

or larger, and wherein residual surface ions and residual surface organics, if any, are present in a concentration of less than one part per million, said apparatus comprising means for contacting a surface of a member to be cleaned with a cleaning solution which impinges on the surface at high speed and flows over the surface to create a scrubbing action on the surface, and means for flowing a rinse liquid in contact with the surface to rinse the surface, said means for flowing a rinse liquid including means for recirculating the rinse liquid into contact with the surface during rinsing and means for filtering the recirculating liquid immediately before it is flowed into contact with the surface to remove all particles having a diameter greater than or equal to 0.2 μ

.

22. An apparatus according to claim 21, further comprising means for heating the rinse liquid before it is flowed in contact with the surface.

23. An apparatus according to claim 21, wherein said means for flowing the rinse liquid in contact with the surface includes at least one spray head having apertures therein for forming jets of rinse liquid for impinging upon the surface.

24. An apparatus according to claim 21, wherein said means for flowing a rinse liquid comprises a container holding a supply of the rinse liquid, a pump for pumping rinse liquid from the container to and through said means for filtering and to said surface for rinsing said surface, said means for filtering being located downstream of said pump and said container along a flow path of the rinse liquid to said surface.

25. An apparatus according to claim 24, wherein said pump is a diaphragm pump.

26. An apparatus according to claim 24, wherein said means for recirculating includes a chamber in which said member is located and including drain means adjacent said surface being rinsed for returning the used rinse liquid from the chamber to the container for recirculating.

27. An apparatus according to claim 21, further comprising means for drying the rinsed surface, said means for drying including means for blowing the surface with dry, filtered nitrogen gas.

28. An apparatus according to claim 21, wherein said means for contacting the surface with a cleaning solution includes a container holding a supply of the cleaning solution and a pump for pumping cleaning solution from the container to and through said means for filtering the rinse liquid for filtering the cleaning solution to remove all particles having a diameter ≧

0.2 μ

.

29. An apparatus according to claim 28, further comprising means for recirculating the used cleaning solution back into contact with the surface by way of the means for filtering.

30. An apparatus according to claim 21, further comprising means for rinsing the cleaned surface with a rinse liquid which is not recirculated.

31. An apparatus according to claim 21, further comprising means for heating the cleaning solution.

32. An apparatus for cleaning a surface to absolute or near-absolute cleanliness such that when dry nitrogen is filtered through a 0.01 μ

filter, passed over the cleaned, dried surface and through a laser particle counter, the laser particle counter will detect less than five particles having a diameter ≧

0.1 μ

per cubic foot of gas flow, a condensation nucleating counter will detect no more than five particles having a diameter of 0.02 μ

or larger, and wherein residual surface ions and residual surface organics, if any, are present in a concentration of less than one part per million, said apparatus comprising a cleaning chamber within which a member having a surface to be cleaned can be placed, a first container holding a cleaning solution, a second container holding a rinse liquid, a pump, a filter, fluid supply line means connecting each of said first and second containers to an input of said pump and connecting an output of said pump with said chamber by way of the filter for filtering the cleaning solution and rinse liquid immediately before introduction into the cleaning chamber, supply valve means in said fluid supply line means for selectively pumping one of the cleaning solution and rinse liquid from its container through the fluid supply line means to the cleaning chamber by way of the pump and filter, fluid return line means for returning the cleaning solution from the chamber to the first container for recirculation and for returning the rinse liquid from the chamber to the second container for recirculation, and return valve means for selectively returning one of the cleaning solution and the rinse liquid to its corresponding container by way of said return line means for recirculation, wherein at least one spray head is provided in said cleaning chamber, said spray head having a plurality of apertures therein for forming jets of cleaning solution and rinse liquid for impinging upon a surface being cleaned, said pump maintaining a pressure of cleaning solution and rinsing liquid of at least 40 psi whereby jets of cleaning solution and rinse liquid impinge upon the surface being cleaned at speeds ≧

60 mph.

33. An apparatus according to claim 32, wherein said fluid return line means includes means for directing a liquid from the cleaning chamber to a drain so that it is not recirculated.

34. An apparatus according to claim 32, wherein each of the first and second containers contains means for heating the liquid therein to a predetermined temperature.

35. An apparatus according to claim 32, wherein said filter removes all particles in a liquid flowing through the filter which have a diameter ≧

0.2 μ

.

36. An apparatus according to claim 32, wherein said pump is a diaphragm pump.

37. An apparatus according to claim 32, wherein said supply valve means and said return valve means are pneumatically operated valves.

38. An apparatus according to claim 32, further comprising a microprocessor which operates the supply valve means and the return valves means to coordinate cleaning and rinsing operating cycles of the apparatus.