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Self-aligned, high resolution resonant dielectric lithography

  • US 5,040,020 A
  • Filed: 11/02/1989
  • Issued: 08/13/1991
  • Est. Priority Date: 03/31/1988
  • Status: Expired due to Fees
First Claim
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1. An optical system, comprising:

  • a mask at least partially opaque to optical radiation of a predetermined frequency;

    a layer of photoimageable material spaced from said mask;

    an intermediate material positioned between said mask and said layer of photoimageable material, said intermediate material having a resonant dielectric increase characteristic which peaks at about the frequency of said optical radiation; and

    means directing optical radiation at said predetermined frequency through said mask and through said intermediate layer to expose said photoimageable material, said resonant dielectric increase substantially reducing the effective wavelength of said optical radiation to provide a high resolution image of said mask in said photoimageable material.

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