Method and apparatus for evaluating surface and subsurface and subsurface features in a semiconductor

• US 5,042,952 A
• Filed: 07/09/1990
• Issued: 08/27/1991
• Est. Priority Date: 05/21/1984
• Status: Expired due to Term

• Current Assignee: The Therma-Wave Incorporated (KLA Corporation)
• Original Assignee: The Therma-Wave Incorporated (KLA Corporation)
• Inventors: Opsal, Jon, Rosencwaig, Allan, Smith, Walter L.
• Primary Examiner(s): Rosenberger, Richard A.
• Application Number:
  US07/550,333
• Time in Patent Office: 414 Days
• Field of Search: 356/432, 356/432 T, 356/445
• US Class Current: 356/432
• CPC Class Codes: G01N 21/171 with calorimetric detection, e.g. with thermal lens detection
• CPC Class Codes: G01R 31/2656 using non-ionising electromagnetic radiation, e.g. optical radiation

Abstract

A method and apparatus are disclosed for evaluating surface and subsurface features in a semiconductor sample. In operation, a periodic energy source is applied to the surface of the semiconductor sample to generate a periodic electron-hole plasma. This plasma interacts with features in the sample as it diffuses. The plasma affects the index of refraction of the sample and the changing plasma density is monitored using a radiation probe. In the preferred embodiment, the radiation probe measures the plasma induced periodic changes of reflectivity of the surface of the sample to yield information about the sample, such as ion dopant concentrations, residue deposits and defects.

Claims

1. An apparatus for evaluating a sample comprising:

means for generating an intensity modulated pump beam of radiation for periodically exciting the surface of the sample with an intensity about 10⁵ Watts/cm² or greater;

means for emitting a radiation probe beam of a fixed wavelength selected to allow focusing in the micron range;

means for focusing the probe beam to a radius in the micron range and for directing the focused probe beam within a portion of the surface of the sample which has been periodically excited in a manner such that said probe beam is reflected;

means for monitoring the variations in the modulated power of said reflected probe beam resulting from changes in the optical reflectivity of the sample; and

means for processing the measured power variations of the reflected probe beam to evaluate the sample.

2. An apparatus as recited in claim 1 wherein said pump beam is focused through said focusing means in a manner to be substantially coincident with the probe beam at the surface of the sample.

3. An apparatus as recited in claim 1 wherein said monitoring means is defined by a photodetector.

4. A method for evaluating a sample comprising the steps of:

generating an intensity modulated pump beam of radiation for periodically exciting the surface of the sample with an intensity about 10⁵ Watts/cm² or greater;

generating a radiation probe beam of a fixed wavelength selected to allow focusing in the micron range;

focusing the probe beam to a radius in the micron range and directing the focused probe beam within a portion of the surface of the sample which has been periodically excited in a manner such that said probe beam is reflected;

monitoring the variations in the modulated power of said reflected probe beam resulting from changes in the optical reflectivity of the sample; and

processing the measured power variations of the reflected probe beam to evaluate the sample.

5. A method as recited in claim 4 further including the step of focusing the pump beam in a manner to be substantially coincident with the probe beam at the surface of the sample.