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Ion-beam based deposition of coatings for electrochromic devices

  • US 5,051,274 A
  • Filed: 09/11/1989
  • Issued: 09/24/1991
  • Est. Priority Date: 09/11/1989
  • Status: Expired due to Fees
First Claim
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1. A method of depositing coatings for electrochromic devices comprising the steps of:

  • providing a light transmissive substrate;

    depositing on thermal vapor deposition a first light transmissive electrically-conductive material on said substrate;

    depositing of thermal vapor deposition an electrochromic material upon said first electrically-conductive material while subjecting said substrate to an ion beam;

    depositing by thermal vapor deposition an electron resistive-ion conductive material on said electrochromic material;

    depositing by thermal vapor deposition an ion resistive-electron conductive material on said electron resistive-ion conductive material; and

    depositing by thermal vapor deposition a second light transmissive electrically-conductive material on said ion resistive-electron conductive material to form an electrochromic device.

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