Permanent magnet force rebalance micro accelerometer

• US 5,060,039 A
• Filed: 02/22/1989
• Issued: 10/22/1991
• Est. Priority Date: 01/13/1988
• Status: Expired due to Term

• Current Assignee: Charles Stark Draper Laboratory Incorporated
• Original Assignee: Charles Stark Draper Laboratory Incorporated
• Inventors: Greiff, Paul, Weinberg, Marc S.
• Primary Examiner(s): Hille, Rolf
• Assistant Examiner(s): FAHMY, WAEL M
• Application Number:
  US07/314,453
• Time in Patent Office: 972 Days
• Field of Search: 357/26, 357/27, 73/503, 73/505, 73/517 B, 73/517 R
• US Class Current: 73/514.24
• CPC Class Codes: G01C 19/5719 using planar vibrating masses driven in a translation vibration along an axis
• CPC Class Codes: G01P 15/125 by capacitive pick-up
• CPC Class Codes: G01P 15/132 with electromagnetic counterbalancing means

Abstract

An accelerometer fabricated by micromachining techniques from a crystaline precursor. The accelerometer is formed in a body of a semiconductor crystal such as silicon by doping portions to an etch resistant condition and etching a cavity around them to release a resiliently suspended multi legged member. A conductor is formed in one of the legs. A permanent magnet is placed with opposite polarity poles on either side of the leg and the acceleration displacement of the member sensed from which a current is developed through the leg conductor to restore the member position and provide an output indication of acceleration.

Claims

1. A micromachined monolithic structure adapted for use in inertial acceleration sensing comprising:

a monolithic body of an etchable structural material and having an etched cavity with a bottom therein;

said monolithic body including a resiliently supported element suspended in said cavity above said bottom and having attachments to said body forming resilient supports for said element which permits said element to rotate about a first axis which passes through said supports;

said resiliently supported element including an opening between first and second segments coupled to said resilient supports, said first and second segments of said resiliently supported element coupled by a crosspiece extending parallel to and laterally displaced from said first axis;

said element and supports having etch resistant dopants therein, and formed in the same structural material as said monolithic body by selectively etching portions of said body;

an electrical conductor extending in a direction parallel to said axis across a portion of a surface of said crosspiece of said element;

a permanent magnet including first and second pole portions disposed on either side of said crosspiece of said element, said first and second pole portions supported to direct magnetic field lines orthogonal to the direction of said conductor where it crosses a portion of said surface of said crosspiece of said element such that rotation of said crosspiece of said element about said axis will cause said conductor to pass through a maximum of magnetic field lines from said permanent magnet; and

means for imparting electrical conductivity to said bottom of said body.

2. The structure of claim 1 wherein said structural material is a crystalline material.

3. The structure of claim 2 wherein said structural material is silicon.

4. The structure of claim 3 wherein said structural material is epitaxial silicon grown over a doped silicon substrate.

5. The structure of claim 4 wherein said substrate forms said cavity bottom.

6. The structure of claim 1 wherein said element is a semiconductor material.

7. The structure of claim 4 wherein said epitaxial silicon has the <

100>

crystal orientation parallel to said element surface.

8. The structure of claim 6 wherein said element is doped silicon.

9. The structure of claim 8 wherein said supports are doped silicon.

10. The structure of claim 1 further including:

means for sensing capacitance between said element and said bottom as an indication of acceleration applied to said element; and

means for applying current through said conductor to torque said element about said axis so as to restore said element to a nominal position.

11. The structure of claim 10 further including means for sensing current through said conductor as an indication of acceleration on said element.