Process for the manufacture of friable silicon nitride bodies

• US 5,061,416 A
• Filed: 10/30/1989
• Issued: 10/29/1991
• Est. Priority Date: 10/30/1989
• Status: Expired due to Fees

• Current Assignee: Norton Company (Compagnie De Saint-Gobain)
• Original Assignee: Norton Company (Compagnie De Saint-Gobain)
• Inventors: Caprera, Brian J., Willkens, Craig A., Corbin, Normand D.
• Primary Examiner(s): DERRINGTON, JAMES H
• Application Number:
  US07/428,710
• Time in Patent Office: 729 Days
• Field of Search: 264/28, 264/343, 264/348, 241/23
• US Class Current: 264/28
• CPC Class Codes: C01B 21/0687 After-treatment, e.g. grinding, purification
• CPC Class Codes: C01P 2004/20 extending in two dimensions, e.g. plate-like
• CPC Class Codes: C01P 2006/10 Solid density

Abstract

A friable silicon nitride body is prepared by infiltrating a non-friable silicon nitride body with a fluid which expands upon freezing, rapidly freezing the fluid, and thawing the frozen fluid. Silicon nitride flakes and chunks obtained with only light pressure on the friable body may then be final milled to a desired particle size more rapidly and with less energy input than with conventionally processed silicon nitride. The silicon nitride body may have a higher density than has previously been used to prepare silicon nitride powders, thereby preventing the generation of potentially hazardous whiskers in the final powder product.

Claims

1. A process for producing a friable silicon nitride body comprising (i) infiltrating a reaction bonded silicon nitride body which has a density of greater than about 1.5 g/cc, outside surfaces, and a central core, with a fluid which will expand upon freezing, (ii) freezing the fluid in the infiltrated body so that the fluid in the outside surfaces of the body freezes before the fluid in the central core, and (iii) thawing the frozen body of silicon nitride.

2. The process of claim 1 further comprising breaking the friable body into pieces suitable for final milling into a powder.

3. The process of claim 1, wherein the fluid is water.

4. The process of claim 1, wherein the infiltration is performed under a vacuum below about 100 mm Hg.

5. The process of claim 1, wherein the freezing comprises immersing the fluid impregnated silicon nitride body in a liquefied gas.

6. The process of claim 5, wherein the liquefied gas is nitrogen.

7. The process of claim 1, wherein steps (ii) and (iii) are repeated up to about 10 times.

8. A process for preparing a friable silicon nitride body comprising (i) infiltrating a body of non-friable reaction bonded silicon nitride with water by immersing the bed in water, (ii) rapidly freezing the water-infiltrated body by immersing it into a liquified gas, and (iii) thawing the body to at least about room temperature.

9. The process of claim 8, wherein the infiltration is performed at a pressure below atmospheric pressure.

10. The process of claim 8, wherein prior to infiltrating with water the body is baked for about 1 to 24 hours at a temperature of about 100°

to 220°

C.

11. The process of claim 10, wherein the liquefied gas is nitrogen.