Toroidal electron cyclotron resonance reactor
First Claim
1. A reactor comprising:
- (a) a plasma generating chamber in which a plasma, comprised of electrical particles, is formed in a plasma source region;
(b) magnet means for generating a poloidal magnetic field having a cylindrical axis of symmetry extending through the chamber;
(c) microwave generating means for generating microwave fields in said plasma generating chamber;
(d) a source of gaseous reactants for supplying gaseous reactants to said plasma generating chamber;
(e) a specimen chamber adjacent said plasma generating chamber with a holding member adapted to hold specimens for processing and structure between the specimen and the plasma generating chamber for blocking the line-of-sight so that the specimen, when so held, is not in line-of-sight with the plasma source region;
(f) a passageway between said specimen chamber and said plasma generating chamber through which said plasma is introduced into said specimen chamber;
(g) pump means for controlling the flow of gaseous reactants into and out of the chamber;
(h) the interaction between said magnetic field and microwave field with said reactants producing said plasma, said magnetic field extending from said source region to said electrode for guiding particles in the plasma until they encounter the specimen.
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Accused Products
Abstract
A toroidal ECR reactor is described in which a poloidal magnetic field is established in a plasma generating chamber in which a specimen to be processed is disposed on an electrode in a specimen chamber. Microwaves and gaseous reactants are introduced into the plasma generating chamber. A plasma discharge occurs in which high energy electrons are confined in a plasma source region extending between a magnetic mirror formed in the specimen chamber out of line-of-sight to the wafer(s) when disposed on the electrode. A baffle region formed between the two chambers prevents microwaves from entering the specimen chamber. The reactor is particularly suitable for etching or depositing films on semiconductor substrates, since the sensitive substrates are not exposed to the high energy ions and/or photons of the source region.
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Citations
33 Claims
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1. A reactor comprising:
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(a) a plasma generating chamber in which a plasma, comprised of electrical particles, is formed in a plasma source region; (b) magnet means for generating a poloidal magnetic field having a cylindrical axis of symmetry extending through the chamber; (c) microwave generating means for generating microwave fields in said plasma generating chamber; (d) a source of gaseous reactants for supplying gaseous reactants to said plasma generating chamber; (e) a specimen chamber adjacent said plasma generating chamber with a holding member adapted to hold specimens for processing and structure between the specimen and the plasma generating chamber for blocking the line-of-sight so that the specimen, when so held, is not in line-of-sight with the plasma source region; (f) a passageway between said specimen chamber and said plasma generating chamber through which said plasma is introduced into said specimen chamber; (g) pump means for controlling the flow of gaseous reactants into and out of the chamber; (h) the interaction between said magnetic field and microwave field with said reactants producing said plasma, said magnetic field extending from said source region to said electrode for guiding particles in the plasma until they encounter the specimen. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A method for processing a specimen comprising the steps of:
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(a) forming a plasma comprising electrical particles in a plasma generating chamber which plasma is contained in a plasma source region; (b) generating a poloidal magnetic field having a cylindrical axis of symmetry extending through the chamber; (c) generating microwave fields and coupling said fields to said plasma; (d) coupling gaseous reactants to said plasma generating chamber; (e) holding said specimen on a holding member in a specimen chamber for processing and in which the specimen, when so held, is out of line-of-sight with the plasma source region; (f) coupling said plasma to said specimen; (g) the interaction between said magnetic field and microwave field producing said plasma, said magnetic field extending from said source region to said electrode for guiding particles in the plasma to the specimen. - View Dependent Claims (24, 25, 26, 27, 28, 29)
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30. A reactor comprising:
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(a) a plasma generating chamber in which a plasma, comprised of electrical particles, is formed in a plasma source region; (b) magnet means for generating a poloidal magnetic field having a cylindrical axis of symmetry extending through the chamber; (c) microwave generating means for generating microwave fields in said plasma generating chamber; (d) a source of gaseous reactants for supplying gaseous reactants to said plasma generating chamber; (e) a specimen chamber adjacent said plasma generating chamber with an electrode adapted to hold specimens for processing and in which the specimen, when so held, is not in line-of-sight with the plasma source region; (f) a passageway between said specimen chamber and said plasma generating chamber through which said plasma is introduced into said specimen chamber, said passageway comprising a baffle region with baffles extending transverse said passageway comprising a baffle region with baffles extending transverse said passageway and further comprised of an annular opening being in the form of rings extending along the cylindrical axis between the two chambers, said annular opening so constructed as to create a pressure differential between the two chambers for cooling energetic particles and confining microwave energy to the plasma generating chamber; (g) pump means for controlling the flow of gaseous reactants into and out of the chamber; (h) the interaction between said magnetic field and microwave field with said reactants producing said plasma, said magnetic field extending from said source region to said electrode for guiding particles in the plasma until they encounter the specimen. - View Dependent Claims (31, 32)
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33. A reactor comprising:
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(a) a plasma generating chamber in which a plasma, comprised of electrical particles, is formed in a plasma source region; (b) magnet means for generating a poloidal magnetic field having a cylindrical axis of symmetry extending through the chamber; (c) microwave generating means for generating microwave fields in said plasma generating chamber; (d) a source of gaseous reactants for supplying gaseous reactants to said plasma generating chamber; (e) a specimen chamber adjacent said plasma generating chamber with an electrode adapted to hold specimens for processing and in which the specimen, when so held, is not in line-of-sight with the plasma source region; (f) a passageway between said specimen chamber and said plasma generating chamber through which said plasma is introduced into said specimen chamber; (g) pump means for controlling the flow of gaseous reactants into and out of the chamber; (h) the interaction between said magnetic field and microwave field with said reactants producing said plasma, said magnetic field extending from said source region to said electrode for guiding particles in the plasma until they encounter the specimen; and (i) a terminating surface in the plasma generating chamber and wherein the microwave fields form modulus B contours and the modulus B in the passageway is higher than at the terminating surface causing a preferential loss of high-energy particles at said terminating surface.
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Specification