Contact configuration for a vacuum interrupter

• US 5,064,976 A
• Filed: 07/20/1990
• Issued: 11/12/1991
• Est. Priority Date: 07/28/1989
• Status: Expired due to Fees

• Current Assignee: Siemens AG
• Original Assignee: Siemens AG
• Inventors: Bialkowski, Guenter, Renz, Roman, Gerlach, Dieter
• Primary Examiner(s): Broome, Harold
• Application Number:
  US07/556,012
• Time in Patent Office: 480 Days
• Field of Search: 200/144 B
• US Class Current: 218/127
• CPC Class Codes: H01H 33/6642 having cup-shaped contacts, the cylindrical wall of which being provided with inclined slits to form a coil

Abstract

A contact configuration, whose axially opposed contacts have a current-supplying stud, a cup-shaped contact carrier and a contact plate set up on the rim of the contact carrier, a support consisting of material with poor electrical conductivity being provided to mechanically stabilize the contact plate. The support forms a tubular supporting region and is located on a graduated circle whose diameter is at most equal to the diameter of the current-supplying stud. The diameter of the current-supplying stud thereby equals at least 50% of the external diameter of the contact carrier. The length of the support has a considerably smaller cross section in its middle than in its base and top region so that the ohmic resistance of the support is at least approximately one magnitude greater than the ohmic resistance of the contact carrier and contact plate.

Claims

1. A contact configuration for a vacuum interrupter, comprising two axially opposed axial field contacts movable relative to each other in an axial direction, each axial field contact comprising a cup-shaped contact carrier and a contact plate disposed on a rim of a wall of the contact carrier, each contact carrier is provided with a cylindrical current-supplying stud, the wall of each contact carrier being provided with slots which form windings that are tilted towards the contact axis, a support comprising a material which has relatively poor electrical conductivity as compared with said contact plate being mounted between the contact carrier and contact plate of each axial field contact, the support being located on a graduated circle within a cross-sectional area of the current-supplying stud while leaving free a central cross-sectional region of the stud, a diameter of the current-supplying stud equalling at least 50% of an external diameter of the contact carrier, and a diameter of the graduated circle for the support also equalling at least 50% of the external diameter of the contact carrier and being at most equal to the external diameter of the current-supplying stud, wherein a length of the support has a considerably smaller cross section in a middle portion than in a base portion and top portion of the support, wherein an ohmic resistance of the support is at least one magnitude ten times greater than an ohmic resistance of the contact carrier and the contact plate.

2. The contact configuration recited in claim 1, wherein the support comprises a thin-walled tube having tubular supporting surfaces located at both ends.

3. The contact configuration recited in claim 1, wherein the support comprises several supporting elements mounted on the graduated circle and forming parallel electric current paths.

4. The contact configuration recited in claim 3, wherein the supporting elements have a post-like or tubular design and are present at least in a quantity of three pieces.

5. The contact configuration recited in claim 3, wherein the supporting elements form a tubular support structure whose wall is provided with several radial perforations.

6. The contact configuration recited in claim 5, wherein the perforations have a round design.

7. The contact configuration recited in claim 6, wherein the diameter of the perforations equals approximately 50% of the length of the tubular support structure.

8. The contact configuration recited in claim 1, wherein the support is soldered both to the contact carrier and to the contact plate.

9. The contact configuration recited in claim 8, wherein the ohmic resistance of the support equals approximately 100 uohm.