Surface pressure distribution detecting element

• US 5,079,949 A
• Filed: 10/16/1990
• Issued: 01/14/1992
• Est. Priority Date: 07/06/1990
• Status: Expired due to Term

• Current Assignee: BMF Corp.
• Original Assignee: ENIX Corporation (Square Enix Holdings Co., Ltd.)
• Inventors: Tamori, Teruhiko
• Primary Examiner(s): Cuchlinski, Jr., William A.
• Assistant Examiner(s): BENNETT, GEORGE B
• Application Number:
  US07/598,290
• Time in Patent Office: 455 Days
• Field of Search: 73/172, 73/865.7, 73/862.07, 73/774, 73/775, 73/776, 73/781, 340/665, 338/99, 128/774
• US Class Current: 73/172
• CPC Class Codes: G06F 3/045 using resistive elements, e.g. a single continuous surface or two parallel surfaces put in contact

Abstract

A detecting element for sensing surface pressure distributions comprising a substantially rigid insulating substrate, a plurality of scanning row electrodes, formed by metal deposition on said substrate, etched to form a pattern of substantially parallel electrodes which are spaced apart and oriented along a first axis, a thin resistive film, deposited on said substrate, having a resistance which varies as a function of contact area, a substantially resilient deformable surface layer, a plurality of scanning column electrodes, formed by metal deposition on said surface layer, etched to form a pattern of substantially parallel column electrodes which are spaced apart, said surface layer being bonded to said substrate by an anisotropic adhesive so that said column electrodes are oriented along a second axis which is perpendicular to said first axis, said surface layer transmitting pressure distribution to said row electrodes, resistive film, and column electrodes to form a matrix of variable contact resistances to provide analog information relating to the distribution of surface pressure applied to said surface layer.

Claims

1. A detecting element for sensing surface pressure distributions comprising:

a substantially rigid insulating substrate;

a plurality of scanning row electrodes, formed by metal deposition on said substrate, etched to form a pattern of substantially parallel electrodes which are spaced apart and oriented along a first axis;

a thin resistive film, deposited on said substrate, having a resistance which varies as a function of contact area;

a substantially resilient deformable surface layer;

a plurality of scanning column electrodes, formed by metal deposition on said surface layer, etched to form a pattern of substantially parallel column electrodes which are spaced apart, said surface layer being bonded to said substrate by an anisotropic adhesive so that said column electrodes are oriented along a second axis which is perpendicular to said first axis, said surface layer transmitting pressure distributions to said row electrodes, resistive film, and column electrodes to form a matrix of variable contact resistances to provide analog information relating to the distribution of surface pressure applied to said surface layer.

2. The detecting element of claim 1 wherein said substantially rigid insulating substrate layer comprises a ceramic layer.

3. The detecting element of claim 1 wherein said substantially resilient deformable surface layer comprises a polyimide layer.

4. The detecting element of claim 1 wherein said substantially resilient deformable surface layer comprises a polyester layer.

5. The detecting element of claim 1 wherein said metal deposition on said substrate to form said scanning row electrodes comprises silver.

6. The detecting element of claim 1 wherein said metal deposition on said substantially resilient deformable surface layer to form said scanning column electrodes comprises copper.

7. The detecting element of claim 1 wherein said thin resistive film is etched to form a resistive fill which remains only at points of intersection of said row and column electrodes.

8. The detecting element of claim 1 wherein a plurality of oxide spacers are formed by oxide deposition on said substrate and etched to form spacer islands at specified points.

9. The detecting element of claim 8 wherein said oxide spacers comprise tungsten dioxide.

10. A detecting element for sensing surface pressure distributions comprising:

a substantially rigid insulating substrate;

a plurality of scanning row electrodes, formed by metal deposition on said substrate, etched to form a pattern of substantially parallel electrodes which are spaced apart and oriented along a first axis;

an anisotropic resistance ceramic plate, formed by separately embedding substantially rectangular resistance bars in a ceramic plate which are spaced apart and substantially parallel, said plate having a lower surface on which metal scanning electrodes are formed by deposition and etched and oriented along same said first axis as said scanning row electrodes;

a substantially resilient deformable surface layer;

a plurality of scanning column electrodes, formed by metal deposition on said surface layer, etched to form a pattern of substantially parallel column electrodes which are spaced apart, said surface layer being bonded to the upper surface of said anisotropic resistance ceramic plate by an anisotropic adhesive so that said column electrodes are oriented along a second axis which is perpendicular to said first axis, said surface layer transmitting pressure distributions to said row electrodes, antisotropic resistance ceramic plate, and column electrodes to form a matrix of variable contact resistances to provide analog information relating to the distribution of surface pressure applied to said surface layer.