×

Plasma density controller for semiconductor device processing equipment

  • US 5,082,517 A
  • Filed: 08/23/1990
  • Issued: 01/21/1992
  • Est. Priority Date: 08/23/1990
  • Status: Expired due to Term
First Claim
Patent Images

1. A plasma density controller for semiconductor device processing equipment for controlling the amount of plasma activation for a process gas as a result of absorbing gas discharge energy from a gas discharge energy source, comprising:

  • a jacket interposed between the gas discharge energy source and the process gas, said jacket adapted for the presence of a control fluid having the ability to variably control the amount of plasma-generating energy that the process gas receives; and

    controls for variably adjusting said control fluid physical parameters to influence the amount of energy the process gas absorbs.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×