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Non-moire' shielded window forming method

  • US 5,084,132 A
  • Filed: 01/14/1991
  • Issued: 01/28/1992
  • Est. Priority Date: 04/13/1989
  • Status: Expired due to Term
First Claim
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1. A method for forming a moire'"'"'-free EMI/RFI shield comprising the steps of:

  • (a) generating a photomask pattern having a series of randomly oriented, interconnected, non-linear elements;

    (b) coating a substrate with a photoresist;

    (c) exposing the photoresist to the photomask;

    (d) developing the exposed photoresist;

    (e) etching the photomask pattern into the substrate;

    (f) washing and removing the photoresist;

    (g) filling the etched pattern in the substrate with an electrically conductive material; and

    (h) placing the placed substrate within a frame for mounting to an electronic device.

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