Semiconductor laser element capable of changing emission wavelength, and method of driving the same

• US 5,088,097 A
• Filed: 04/04/1990
• Issued: 02/11/1992
• Est. Priority Date: 04/04/1990
• Status: Expired due to Term

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Sakata, Hajime, Ono, Takeo
• Primary Examiner(s): Davie, James W.
• Application Number:
  US07/504,626
• Time in Patent Office: 678 Days
• Field of Search: 372/20, 372/45, 372/46, 372/50, 372/96, 350/96.14
• US Class Current: 372/20
• CPC Class Codes: H01S 3/1055 one of the reflectors being constituted by a diffraction grating
• CPC Class Codes: H01S 5/06256 with DBR-structure
• CPC Class Codes: H01S 5/06258 with DFB-structure
• CPC Class Codes: H01S 5/12 the resonator having a periodic structure, e.g. in distributed feedback [DFB] lasers comprising a photonic bandgap structure H01S5/11; surface-emitting lasers H01S5/18
• CPC Class Codes: H01S 5/125 Distributed Bragg reflector [DBR] lasers
• CPC Class Codes: H01S 5/5045 the arrangement having a frequency filtering function

Abstract

A wavelength selective filter capable of changing a selected wavelength over a wide range, andd a method for driving such a filter. The wavelength selective filter has a substrate and an optical waveguide layer including a superlattice structure on the substrate. The optical waveguide layer includes a reflection portion and an optical waveguide portion which are juxtaposed in a light propagation direction. A diffraction grating is formed in the reflection portion of the optical waveguide layer, and an electrode is formed in the reflection portion for applying voltage.

Claims

1. A wavelength selective filter comprising:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on said substrate, said optical waveguide layer including a reflection portion and an optical waveguide portion which are arranged along a light propagation direction;

a grating formed in said reflection portion of said optical waveguide layer; and

an electrode formed on said reflection portion of said optical waveguide layer for applying voltage;

wherein said filter satisfies the following equation;

space="preserve" listing-type="equation">l.sub.A Δ

α

.sub.A (E)+l.sub.B Δ

α

.sub.A (λ

)=0

where l_A and l_B are the lengths of said reflection portion and said optical waveguide portions in the light propagation direction, E is the voltage applied from said electrode, Δ

α

_A (E) is the increase in absorption coefficient in the optical waveguide layer caused upon application of the voltage, λ

is the wavelength of light guided in said optical waveguide layer, and Δ

α

_A (λ

) is the decrease in absorption coefficient when guided light is shifted toward a long wavelength side.

2. A filter according to claim 1, wherein a period in which a pitch of a grating is shifted is formed on a portion of said diffraction grating.

3. A filter according to claim 1, wherein said electrode is split into a plurality of portions capable of independently applying voltages.

4. A filter according to claim 1, wherein a groove is formed between said reflection portion and said optical waveguide portion.

5. A filter according to claim 1, further comprising first and second cladding layers sandwiching said optical waveguide layer.

6. A filter according to claim 1, further comprising a power source connected to said electrode.

7. A filter according to claim 1, wherein said substrate and said optical waveguide layer comprise a compound selected from the group consisting of GaAs and AlGaAs.

8. A method for wavelength selective filtering of light using an optical device which comprises:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on the substrate, the optical waveguide layer including a reflection portion and an optical waveguide portion which are arranged along a light propagation direction;

a grating formed in the reflection portion of the optical waveguide layer; and

an electrode formed on the reflection portion of the optical waveguide layer, said method comprising the steps of;

causing light to be incident on the optical waveguide layer;

causing the grating to reflect a light component having a selected wavelength of the incident light;

extracting the remaining light components excluding the light component reflected by the grating from the optical waveguide layer;

applying a reverse bias electric field to the electrode to change the refractive index of the reflection portion of the optical waveguide layer by utilizing the quantum confinement Stark effect so that the wavelength of the light reflected by said grating changes; and

compensating the change of light absorption in said reflection portion of the optical waveguide layer caused by application of the electric field by the change of light absorption in said optical waveguide portion of the optical waveguide layer caused by the change of the wavelength.

9. A wavelength selective filter comprising:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on said substrate, said optical waveguide layer including a reflection portion and a light gain portion which are arranged along a light propagation direction;

a grating formed in said reflection portion of said optical waveguide layer;

a first electrode formed on said reflection portion of said optical waveguide layer for applying a voltage;

a second electrode formed on said light gain portion of said optical waveguide layer for supplying a current; and

a third electrode formed between said reflection portion and said light gain portion of said optical waveguide layer.

10. A filter according to claim 9, further comprising a third electrode formed between said reflection portion and said light gain portion.

11. A filter according to claim 9, further comprising first and second cladding layers formed on and under said optical waveguide layer.

12. A filter according to claim 9, further comprising first and second power sources respectively connected to said first and second electrodes.

13. A filter according to claim 9, wherein said substrate and said optical waveguide layer comprise a compound selected from the group consisting of GaAs and AlGaAs.

14. A method for wavelength selective filtering of light using an optical device which comprises:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on the substrate, the optical waveguide layer including a reflection portion and a light gain portion which are arranged along a light propagation direction;

a grating formed in the reflection portion of the optical waveguide layer;

a first electrode formed on the reflection portion of said optical waveguide layer; and

a second electrode formed on the light gain portion of the optical waveguide layer, said method comprising the steps of;

causing light to be incident on the optical waveguide layer;

causing the grating to reflect a light component having a selected wavelength of the incident light;

extracting the remaining light components excluding the light component reflected by the grating from the optical waveguide layer;

applying a reverse bias electric field to the first electrode to change the refractive index of the reflection portion of the optical waveguide layer utilizing the quantum confinement Stark effect so that the wavelength of the light reflected by the grating changes; and

supplying current from the second electrode to the light gain portion of the optical waveguide layer to impart the gain to the waveguide light so that the change in light absorption in the reflection portion of the optical waveguide layer caused by application of the electric field from the first electrode is compensated.

15. A wavelength selective optical device comprising:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on said substrate;

a grating formed on said optical waveguide layer, a part of said grating being provided with a period conversion portion in which a period of the grating is shifted; and

an electrode for applying a reverse bias electric field to the optical waveguide layer.

16. A device according to claim 15, further comprising first and second cladding layers sandwiching said optical waveguide layer.

17. A device according to claim 15, further comprising a power source connected to said electrode.

18. A device according to claim 15, wherein said substrate and said optical waveguide layer comprise GaAs or AlGaAs.

19. A wavelength selective optical device comprising:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on said substrate, said optical waveguide layer including first and second portions which are arranged along a light propagation direction;

gratings formed in said first and second portions of said optical waveguide layer for reflecting a light component having a selected wavelength of a waveguide light;

a first electrode formed on said first portion of said optical waveguide layer; and

a second electrode formed on said second portion of said optical waveguide layer;

wherein voltages that differ from each other are respectively applied to said first and second electrodes whereby a shift is caused between a light wave reflected by said grating in said first portion and a light wave reflected by said grating in said second portion so as to cause a peak in a transmission spectrum of the optical device.

20. A device according to claim 19, further comprising first and second cladding layers sandwiching said optical waveguide layer.

21. A device according to claim 19, further comprising first and second power sources connected to said first and second electrodes, respectively.

22. A device according to claim 19, wherein said substrate and said optical waveguide layer comprise GaAs or AlGaAs.

23. A wavelength selective optical device comprising:

a substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on said substrate, said optical waveguide layer including a light gain portion provided in the central portion in a light propagation direction and first and second reflection portions which are arranged at both sides of said light gain portion along the light propagation direction;

gratings formed in said first and second reflection portions of said optical waveguide layer;

first and second electrodes respectively formed on said first and second reflection portions of said optical waveguide layer for applying a reverse bias electric field; and

a third electrode formed on said light gain portion of said optical waveguide layer for supplying a current.

24. A device according to claim 23, further comprising first and second cladding layers sandwiching said optical waveguide layer.

25. A device according to claim 23, further comprising first, second and third power sources connected to said first, second and third electrodes, respectively.

26. A device according to claim 23, wherein said substrate and said optical waveguide layer comprise GaAs or AlGaAs.

27. A wavelength selective optical device comprising:

a substrate;

a first cladding layer formed on said substrate;

an optical waveguide layer which includes a superlattice structure and which is formed on said first cladding layer, said optical waveguide layer including a reflection portion and a light gain portion which are arranged along a light propagation direction;

a grating formed in said reflection portion of said optical waveguide layer;

a first electrode directly formed on said grating in said reflection portion of said optical waveguide layer for applying a reverse bias electric field;

a second cladding layer formed on said second cladding layer for supplying a current to said light gain portion of said optical waveguide layer.

28. A device according to claim 27, further comprising first and second power sources connected to said first and second electrodes, respectively.

29. A device according to claim 27, wherein said substrate, said optical waveguide layer and said first and second cladding layers comprise GaAs or AlGaAs.