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Method for preparing vaporized reactants for chemical vapor deposition

  • US 5,090,985 A
  • Filed: 10/04/1990
  • Issued: 02/25/1992
  • Est. Priority Date: 10/17/1989
  • Status: Expired due to Term
First Claim
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1. A process for preparing vaporized reactants, comprising the steps of:

  • A) providing a coating precursor selected from metal or silicon compounds at a temperature above its melting point but substantially below its standard vaporization temperature, thereby causing the coating precursor to be in the form of a liquid;

    B) simultaneously and continually performing the steps of;

    i) injecting the liquid coating precursor into a vaporization chamber, defined in part by at least one peripheral wall, wherein the liquid coating precursor produces a vapor;

    ii) admitting to the vaporization chamber a blend gas in an amount sufficient to increase the mass transport of the coating precursor vapor and thus cause accelerated vaporization of the liquid coating precursor;

    iii) mixing the liquid coating precursor, coating precursor vapor and blend gas, including dispensing the liquid precursor as a thin film along said chamber wall;

    whereby the liquid coating precursor is completely vaporized at a temperature below its standard vaporization temperature, to prepare a vaporized reactant gas stream having a high, uniform concentration of coating precursor; and

    C) conveying the reactant gas stream away from the vaporization chamber and into contact with a substrate.

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