Substrate heater and heating element

• US 5,093,557 A
• Filed: 05/16/1989
• Issued: 03/03/1992
• Est. Priority Date: 05/16/1989
• Status: Expired due to Fees

• Current Assignee: Microscience Incorporated Norwell MA
• Original Assignee: Microscience Ltd. (Emergent Biosolutions Inc.)
• Inventors: Westner, August O., Lok, Charles K. C.
• Primary Examiner(s): Walberg, Teresa J.
• Application Number:
  US07/352,510
• Time in Patent Office: 1,022 Days
• Field of Search: 219/405, 219/411, 219/388, 219/390, 432/253, 432/258, 432/259, 118/728, 118/729, 118/725, 198/470.1, 198/692, 198/693
• US Class Current: 219/388
• CPC Class Codes: C23C 14/541 Heating or cooling of the substrates
• CPC Class Codes: C23C 16/46 characterised by the method used for heating the substrate C23C16/48, C23C16/50 take precedence
• CPC Class Codes: C30B 25/10 Heating of the reaction chamber or the substrate
• CPC Class Codes: C30B 31/12 Heating of the reaction chamber
• CPC Class Codes: H05B 3/265 the insulating base being an inorganic material, e.g. ceramic H05B3/262 takes precedence

Abstract

Heat is provided to substrates at a step of a process by providing identical movable heating devices, one for each substrate, placing each substrate onto one of the heating devices, sequentially moving each device into a position where the step of the process can be performed on the substrate, and causing each of the devices to provide heat to the substrate at each step of the process.

Claims

1. A method for providing uniform heat to substrates at a step of a process, said method comprising

providing separate movable heating devices, one for each substrate;

placing each said substrate onto one of said devices;

sequentially moving each said device into a position where said step of said process can be performed on said substrate; and

causing each of said devices alone to provide heat to said substrate at said step of said process.

2. The method of claim 1, wherein said step of moving each said device comprises inserting a support into a portion of said device and causing said support to transfer said device to another position where another step of said process can be performed.

3. The method of claim 1, wherein said step of moving said device comprises engaging a support on an external wall of said device and causing said support to transfer said device to another position where another step of said process can be performed.

4. The method of claim 1, further comprising moving said devices sequentially into another said position.

5. The method of claim 1, wherein said process step is performed in a vacuum environment.

6. The method of claim 5 wherein said vacuum environment is held at any chosen level below atmospheric pressure down to 10^-11 Torr.

7. The method of claim 6 wherein said heating results in a temperature on said substrate of at least 1000°

C.

8. The method of claim 7 wherein said temperature varies by no more or less than 50°

C. across said substrate.

9. The method of claim 1 wherein said step is performed in an oxygen environment.

10. The method of claim 9, said oxygen environment being held at a chosen partial pressure within the range of 10^-3 to 760 Torr.

11. A movable apparatus for resistive heating a substrate, said apparatus comprising

a pair of holes, each hole being positioned to receive a separate prong of a fork support, and

sides configured to receive a second alterative support,

said holes and said sides being configured to enable movement of said apparatus from a first position to a second position.

13. The apparatus of claim 11 or 12, said apparatus being electrically conductive.

14. The apparatus of claim 13 wherein said fork holes have electrically conductive walls.

15. The apparatus of claim 14 wherein said pins are electrically conductive.

16. The apparatus of claim 15 wherein said sides are electrically conductive.

17. The apparatus of claim 14, further comprising a conductive oxidation resistant wire heating alloy.

12. A movable apparatus for resistive heating a substrate, said apparatus comprising

a pair of holes, each hole being positioned to receive a separate prong of a fork support, and

pins downwardly directed for resting within holes of a second support,

said holes and said pins being configured to enable movement of said apparatus from a first position to a second position.

18. A movable apparatus for resistive heating a substrate, said apparatus comprising

holes for receiving a fork support, wherein said holes comprise electrically conductive walls,

electrically conductive sides configured to receive a second alternative support,

said holes and said sides being configured to enable movement of said apparatus from a first position to a second position,

a conductive oxidation-resistant wire heating alloy,

nonconductive means separating said alloy from said substrate, wherein said wire alloy, having a first and a second end, is wrapper around said nonconductive means.

19. The apparatus of claims 18, further comprising

a first conductive screw for holding said first end of said wrapped alloy, and

a second conductive screw for holding said second end of said wire alloy.

20. The apparatus of claim 19 wherein an external power source is electrically coupled to said apparatus and said first screw is in electrical contact with said fork holes, wherein said fork holes are able to conduct current supplied by said power source to said first screw through said wrapped wire to said second screw.

21. The apparatus of claim 19 wherein an external power source is electrically coupled to said apparatus and said first screw is in electrical contact with said sides, wherein said sides are able to conduct current supplied by said power source to said first screw through said wrapped wire to said second screw.

22. The apparatus of claim 18 wherein an external power source is electrically coupled to said apparatus and said first screw is in electrical contact with said pins, wherein said pins are able to conduct current supplied by said power source to said first screw through said wrapped wire to said second screw.

23. A movable apparatus for resistive heating a substrate, said apparatus comprising

holes for receiving a fork support, wherein said holes comprise electrically conductive walls,

electrically conductive pins downwardly directed for resting within holes of a second support,

said holes and said pins being configured to enable movement of said apparatus from a first position to a second position,

a conductive oxidation-resistant wire heating alloy, and

nonconductive means separating said alloy from said substrate, wherein said wire alloy, having a first and a second end, is wrapped around said nonconductive means.