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Rotating cylindrical magnetron structure for large area coating

  • US 5,096,562 A
  • Filed: 11/06/1990
  • Issued: 03/17/1992
  • Est. Priority Date: 11/08/1989
  • Status: Expired due to Term
First Claim
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1. In a magnetron of a type having a target surface formed on an outside of a cylinder that is positioned within walls of a vacuum chamber and which contains a magnet structure within it that extend substantially its full length, a mechanism for supporting, rotating, cooling and energizing the target structure, comprising:

  • first and second extensions from opposite ends of the target cylinder and rigidly attached thereto, said extensions being cylindrically shaped with axial center lines coincident with that of said target cylinder,means within said target cylinder for restraining said magnet structure from rotating therewith, and wherein said magnet structure includes a plurality of rollers carried thereby and riding on an inside surface of said target cylinder, thereby to maintain separation between said magnetic structure and the inside surface of said target structure,a first support structure attached to said vacuum chamber walls and rotatably carrying said first extension in a manner that restrains movement of thereof in an axial direction,a second support structure attached to said vacuum chamber walls and rotatably carrying said second extension in a manner that allows movement thereof in an axial direction,means provided as part of said first support structure for both supplying and withdrawing cooling fluid from within said target cylinder,means provided as part of either of said first or second support structures for rotating the target cylinder, andmeans provided as part of said second support structure and including an electrical brush contacting said second target cylinder extension for electrically energizing said target surface.

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