Polymeric mixtures and process therefor

• US 5,102,924 A
• Filed: 08/16/1990
• Issued: 04/07/1992
• Est. Priority Date: 08/16/1990
• Status: Expired due to Term

• Current Assignee: 3M Company
• Original Assignee: 3M Company
• Inventors: DeVoe, Robert J., Williams, Jerry W.
• Primary Examiner(s): McCamish, Marion E.
• Assistant Examiner(s): BERMAN, SUSAN W
• Application Number:
  US07/568,088
• Time in Patent Office: 600 Days
• Field of Search: 522/4, 522/29, 522/174, 522/15
• US Class Current: 522/4
• CPC Class Codes: C08F 2/48 by ultraviolet or visible light
• CPC Class Codes: C08F 222/102 of dialcohols, e.g. ethylene glycol di(meth)acrylate or 1,4-butanediol dimethacrylate
• CPC Class Codes: C08G 18/637 characterised by the in situ polymerisation of the compounds having carbon-to-carbon double bonds in a reaction mixture of saturated polymers and isocyanates
• CPC Class Codes: C09D 4/00 Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

Abstract

A tough polymeric mixture comprises the polymerized product of admixture I or II, wherein

admixture I comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one free-radically polymerizable monomer, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one set of polyurethane precursors, and

admixture II comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one set of polyurethane precursors, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one free-radically polymerizable monomer,

said polymeric mixture having been prepared by a process involving two sequential actinic radiations of wavelengths ranges centered around λ₁ and λ₂, respectively, wherein λ₁ and λ₂ differ from each other by at least 30 nm, and

wherein the actinic radiation centered λ₁ does not substantialy polymerize the second monomer, and

wherein the area under a stress-strain curve as determined by ASTM D638-89 for said polymeric mixture is at least 10 percent greater, preferably 20 percent greater, and more preferably at least 50 percent greater when said precursor monomers are cured by said sequential photoinitiation process compared to when the same mixture is cured by a single photostage cure.

Claims

1. A process for preparing a tough polymeric mixture comprising the steps of:

a) providing admixture I or II

wherein

admixture I comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one free-radically polymerizable monomer, and 95 to 55 weight percent of a second monomer and a photoinitiator therefor, said second monomer being at least one set of polyurethane precursors selected from the group consisting of one or more diisocyanates and polyisocyanates, and one or more monomers bearing at least two isocyanate-reactive groups, and

admixture II comprises 5 to 45 weight percent of a first monomer and a photoinitiator therefor, said first monomer being at least one set of polyurethane precursors as defined above, and 95 to 55 weight percent of a second monomer and a photoinitiatro therfor, said second monmer being at least one free-radically polymerizable monomer, and

b) exposing sequentially said admixture I or II to first and second actinic radiations of wavelength ranges centered around λ

₁ and λ

₂, respectively, wherein said first actinic radiation activates said photinitiatro of said first monomer without substantially activating said photoinitiator for said second monomer, and wherein said second actinic radiation activates said photinitiator for said second monomer, and

wherein λ

₁ and λ

₂ differ from each other by at least 30 nm, and

wherein the monomer present in lesser amount is exposed to said first actinic radiation centered around λ

₁ and wherein said monomer present in greater amount is exposed to said second and subsequent actinic radiation centered around λ

₂,

wherein the actinic radiation centered around λ

₁ does not substantially polymerize the second monomer, and

wherein the area under a stress-strain curve as determined by ASTM D638-89 for said polymeric mixture is at least 10 percent greater when said precursor monomers are cured by said sequential photoinitiation process compared to that are for the mixture when cured by a single photostage curing process.

2. The method according to claim 1 wherein admixture I and admixture II further comprise an effective amount of at least one crosslinking agent.

3. The method according to claim 1 wherein at least one of λ

₁ and λ

₂ is in the visible region of the spectrum.

4. The method according to claim 1 wherein at least one of λ

₁ and λ

₂ is in the ultraviolet region of the spectrum.

5. The method according to claim 1 wherein at least one of said actinic radiation exposures is preceded by, is simultaneous with, or is followed by heating the mixture.

6. The method according to claim 1 wherein said first monomer is precured sufficiently to provide a coatable syrup.

7. The process according to claim 1 wherein said polyurethane precursors of admixture I are present in the range of 90 to 60 weight percent and said free radically polymerizable monomers are present in the range of 10 to 40 weight percent of the total composition.

8. The process according to claim 1 wherein said free-radically polymerizable monomers of admixture II are present in the range of 90 to 60 weight percent and said polyurethane precursors are present in the range of 10 to 40 weight percent of the total composition.

9. The process according to claim 1 wherein said free-radically polymerizable monomer of admixture I or II is selected from the group consisting of acrylate, methacrylate, and vinyl ester functionalized materials.

10. The process according to claim 1 wherein said polyurethane precursors of admixture I or II are an aliphatic polyisocyanate and a polyol.

11. The process according to claim 1 wherein said photoinitiator for said polyurethane precursors of admixture I or II is selected from the group consisting of diazonium salts and salts of transition metal-containing organometallic complex cations.

12. The process according to claim 2 wherein said transition metal-containing organometallic complex cation contains iron.

13. The process according to claim 1 wherein said free-radical photoinitiator for admixture I or II is selected from the group consisting of acetophenones, ketals, benzophenones, benzion ethers, triazines, arylglyoxalates, acylphosphine oxides, sulfonium salts, iodonium salts, diazonium salts, and peroxides.

14. The process according to claim 1 wherein said free-radical photoinitiator for admixture I or II is selected from the group consisting of acetophenones and benzoin ethers.

15. The process according to claim 1 wherein said total photoinitiator system for admixture I or II is present in the range of 0.01 to 20 weight percent of the total polymerizable composition.

16. The process according to claim 1 wherein said polyurethane initiator to free-radical initiator for admixture I or II is present in the range of 1:

100 to 100;

1 by weight.

17. The process according to claim 1 further comprising at least one photosensitizer.

18. The process according to claim 1 wherein the area under said stress-strain curve is at least 20 percent greater compared to a stress-strain curve for the same mixture when cured by a single photostage curing process.

19. The process according to claim 1 wherein the area under said stress-strain curve is at least 50 percent greater compared to a stress-strain curve for the same mixture when cured by a single photostage curing process.

20. The process according to claim 1 wherein said free-radical photoinitiator is 2,2-dimethoxy-2-phenylacetophenone and said photoinitiator for said polyurethane precursors is (eta⁶ -xylene)(eta⁵ -cyclopentadienyl)iron(1+) hexafluorophosphate.