Diffusion plasma-assisted chemical treatment apparatus

• US 5,105,761 A
• Filed: 10/15/1990
• Issued: 04/21/1992
• Est. Priority Date: 10/19/1989
• Status: Expired due to Fees

• Current Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission)
• Original Assignee: Commissariat a L'Energie Atomique (French Alternative Energies and Atomic Energy Commission)
• Inventors: Charlet, Barbara, Peccoud, Louise, Sindzingre, Thierry
• Primary Examiner(s): Simmons, David A.
• Assistant Examiner(s): Goudreau, George A.
• Application Number:
  US07/597,812
• Time in Patent Office: 554 Days
• Field of Search: 118/723, 118/733, 118/719, 156/345
• US Class Current: 118/723.0ME
• CPC Class Codes: H01J 37/32357 Generation remote from the workpiece, e.g. down-stream
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

The apparatus comprises a tight treatment enclosure (10), means (20,22) for the axial production of a carrier gas plasma, a solid plate (30) serving as an obstacle to the plasma and located perpendicular to the enclosure axis and downstream of the plasma production means, plasma diffusion means (40) located downstream of the obstacle plate, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure beneath the diffusion means and all located in the same plane around the enclosure axis, a substrate carrier (56) positioned downstream of the vector gas supply tubes and perpendicular to the axis and annular pumping means (66,16) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier.

Claims

1. Diffusion plasma-assisted chemical treatment apparatus incorporating a tight treatment enclosure (12) having an axis of symmetry (18), axial production means (20, 22) for a plasma of a carrier gas in the enclosure, at least one continuous solid plate (30) serving as an obstacle to the plasma and positioned perpendicular to the axis (18) and downstream of the production means, plasma diffusion means (40) located downstream of the plate (30) in the enclosure, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure, beneath the diffusion means (40), the ends (52) of said tubes issuing into the enclosure being in the same plane around the enclosure axis and being arranged to provide a delocalized distribution of vector gas, at least one substrate carrier (56) located in the enclosure downstream of the supply tubes and perpendicular to the enclosure axis and annular, axial pumping means (16, 64, 66) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier.

2. Apparatus according to claim 1, characterized in that it also comprises a perpheral buffer chamber (48) surrounding the axis (18) and linked with the supply tubes (50) and the vector gas supply means (38) for said buffer chamber.

3. Apparatus according to claim 2, characterized in that the buffer chamber (48) is toroidal.

4. Apparatus according to claim 1, characterized in that the tube ends (52) are arranged according to concentric circles centered on the enclosure axis.

5. Apparatus according to claim 1, characterized in that the tubes (50) are made from an electricity conducting material, their outer wall then being coated with an electrically insulating material (72) and then a conductive material (74).

6. Apparatus according to claim 5, characterized in that polarization means (68) for the tubes (50) or the conductive material (74) are provided.

7. Apparatus according to claim 1, characterized in that it also comprises a buffer chamber (32) sealed by a perforated plate (40) constituting the plasma diffusion means, said chamber (32) communicating with the plasma production means (20,22), the obstacle plate contained in said chamber defining with the latter a peripheral space (42) for the passage of the plasma.

8. Apparatus according to claim 1, characterized in that the plasma production means (20,22) comprise an axial carrier gas supply (20) coupled to carrier gas exciting means (22).

9. Apparatus according to claim 1, characterized in that the plasma production means comprise a surfaguide (22).

10. Apparatus according to claim 1, characterized in that substrate carrier heating and/or polarization means (59) are provided.

11. Apparatus according to claim 6, characterized in that the perforated plate (40) has dimensions greater than those of the substrate carrier (56) or the substrate carrier assembly.

12. Diffusion plasma-assisted chemical treatment apparatus incorporating a tight treatment enclosure (12) having an axis of symmetry (18), axial production means (20,22) for a plasma of a carrier gas in the enclosure, at least one continuous solid plate (30) serving as an obstacle to the plasma and positioned perpendicular to the axis (18) and downstream of the production means, plasma diffusion means (40) located downstream of the plate (30) in the enclosure, several non-ionized vector gas supply tubes (50) issuing axially into the enclosure, beneath the diffusion means (40), the ends (52) of said tubes issuing into the enclosure being in the same plane around the enclosure axis and being arranged in concentric circles centered on the enclosure axis, at least one substrate carrier (56) located in the enclosure downstream of the supply tubes and perpendicular to the enclosure axis and annular, axial pumping means (16, 64, 66) for the gaseous medium contained in the enclosure and positioned downstream of the substrate carrier.