Ion source having auxillary ion chamber
First Claim
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1. An ion source, comprising:
- an auxiliary plasma chamber having a gas inlet for ionization and an electron emitting port disposed therein;
high-frequency discharge means for generating a subplasma by ionizing the gas introduced into said auxiliary plasma chamber;
a main plasma chamber;
an electric insulator, said main plasma chamber being connected via said electric insulator to the electron emitting port of said auxiliary plasma chamber, electrons being emitted from said auxiliary plasma chamber into said main plasma chamber;
d.c. voltage applying means for generating a main plasma in said main plasma chamber by means of d.c. discharge; and
means for drawing ions from the main plasma generated in said main plasma chamber and for forming ion beams.
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Abstract
An ion source having an auxiliary plasma chamber and a main plasma chamber. The auxiliary plasma chamber receives an ionizable gas and is provided with microwaves with sufficient power to create a high frequency discharge and generate a subplasma for sustaining the creation of an ion plasma in the main chamber. Multiple auxiliary plasma chambers may be used and each may be separately regulated. Protective plates, screens, and coatings may be provided to protect the ion plasma of the main chamber from sputtering a facing wall of the auxiliary plasma chamber.
322 Citations
18 Claims
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1. An ion source, comprising:
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an auxiliary plasma chamber having a gas inlet for ionization and an electron emitting port disposed therein; high-frequency discharge means for generating a subplasma by ionizing the gas introduced into said auxiliary plasma chamber; a main plasma chamber; an electric insulator, said main plasma chamber being connected via said electric insulator to the electron emitting port of said auxiliary plasma chamber, electrons being emitted from said auxiliary plasma chamber into said main plasma chamber; d.c. voltage applying means for generating a main plasma in said main plasma chamber by means of d.c. discharge; and means for drawing ions from the main plasma generated in said main plasma chamber and for forming ion beams. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. An ion source comprising:
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an auxiliary plasma chamber having a gas inlet for ionization at one end thereof and an electron emitting port at the other end thereof; high frequency discharge means for generating a subplasma by ionizing the gas introduced into said auxiliary plasma chamber; a main plasma chamber; an electric insulator; said main plasma chamber being connected via said electric insulator to the electron emitting port of said auxiliary plasma chamber; d.c. voltage applying means for generating a main plasma in said main plasma chamber by means of d.c. discharge; means for drawing ions from the main plasma generated in main plasma chamber and for forming ion beams; a protective plate provided between said auxiliary plasma chamber and said main plasma chamber, and positioned to protect the external joining wall of said auxiliary plasma chamber from being bombarded by ions of the main plasma chamber, said protective plate being so biased as to have potential higher than that of said auxiliary plasma chamber but lower than that of said main plasma chamber; and
,a second electric insulator separating said auxiliary and main plasma chambers, and wherein said protective plate is positioned sandwiched between said first and second insulators.
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Specification