Method and apparatus for coupling a microwave source in an electron cyclotron resonance system

• US 5,111,111 A
• Filed: 09/27/1990
• Issued: 05/05/1992
• Est. Priority Date: 09/27/1990
• Status: Expired due to Fees

• Current Assignee: Consortium For Surface Processing, Inc.
• Original Assignee: Consortium For Surface Processing, Inc.
• Inventors: Colestock, Patrick L., Cecchi, Joseph L., Stevens, James E.
• Primary Examiner(s): LaRoche, Eugene R.
• Assistant Examiner(s): YOO, DO H
• Application Number:
  US07/589,078
• Time in Patent Office: 586 Days
• Field of Search: 315/111.21, 315/111.41, 315/111.81, 313/231.31, 250/433 R, 204/298.38
• US Class Current: 315/111.41
• CPC Class Codes: H01J 37/32192 Microwave generated discharge H01J37/32357, H01J37/32366, H01J37/32394, H01J37/32403 take precedence
• CPC Class Codes: H01J 37/32238 Windows
• CPC Class Codes: H01J 37/32284 Means for controlling or selecting resonance mode
• CPC Class Codes: H01J 37/32293 using particular waveforms, e.g. polarised waves
• CPC Class Codes: H01J 37/32678 Electron cyclotron resonance
• CPC Class Codes: H05H 7/02 Circuits or systems for supplying or feeding radio-frequency energy radio-frequency generators H03B

Abstract

A microwave source is coupled to an electron cyclotron resonance (ECR) system by circularly polarizing the microwave energy from the source in an angular direction with cooperates with the ECR system'"'"'s magnetic field to produce electron cyclotron resonance, and coupling the circularly polarized microwave energy to the plasma using a quarter wave vacuum window transformer having a dielectric constant which matches the impedance of the circularly polarized microwave energy to the impedance of the plasma. The impedance matching transformer is preferably a vacuum window of the ECR chamber having quarter wave thickness and the appropriate dielectric constant. For high density plasmas in a standard ECR system of 6 cm radius an alumina window 0.98 cm thick procides optimum coupling. The reflected power from the plasma is thereby minimized to provide a dense plasma for the ECR tool while reducing or eliminating the need for manual external tuners for the microwave source.

Claims

1. An electron cyclotron resonance apparatus comprising:

a processing chamber;

gas supplying means for supplying gas to said processing chamber;

microwave generating means for generating microwave energy;

circular polarizing means coupled to said microwave generating means, for circularly polarizing the microwave energy in a first angular direction and for suppressing circularly polarized microwave energy in a second angular direction opposite the first angular direction;

magnetic field generating means for generating a magnetic field in said processing chamber, the magnetic field causing electrons in said processing chamber to rotate in the first angular direction in electron cyclotron resonance to thereby generate a plasma of the gas in the processing chamber;

transforming means coupled between said circular polarizing means and said processing chamber, for matching the impedance of said circularly polarized microwave energy in the first angular direction, to the impedance of said plasma, to thereby couple the circularly polarized microwave energy in the first angular direction to the plasma; and

means for adjusting said magnetic field generating means to minimize remnants of microwave energy which are reflected from the plasma;

wherein said adjusting means comprises;

means, coupled to said processing chamber, for measuring said remnants of reflected microwave energy in said chamber; and

an electronic controller, responsive to said measuring means and operatively connected to said magnetic field generating means, for adjusting said magnetic field generating means to minimize the measured remnants of reflected microwave energy.

2. The electron cyclotron resonance apparatus of claim 1 wherein said transforming means comprises a window coupled between said circular polarizing means and the processing chamber, at least one of the composition and the thickness of said window being selected to match the impedance of said circularly polarized microwave energy to the impedance of said plasma in the chamber.

3. The electron cyclotron resonance apparatus of claim 2 wherein said microwave generating means generates microwave energy of a predetermined frequency and wherein the thickness of said window is one quarter wavelength of the predetermined frequency.

4. The electron cyclotron resonance apparatus of claim 2 wherein the composition of said window is selected to produce an impedance equal to the square root of the impedance of the plasma times the impedance of the circularly polarized microwave energy.

5. The electron cyclotron resonance apparatus of claim 2 wherein said window comprises a vacuum window for sealing said chamber.

6. The electron cyclotron resonance apparatus of claim 1 wherein said circular polarizing means polarizes the microwave energy in right hand circular polarization.

7. The electron cyclotron resonance apparatus of claim 1, wherein said circular polarizing means polarizes the microwave energy in right hand circularly polarized TE₁₁ mode.

8. The electron cyclotron resonance apparatus of claim 1 wherein said transforming means comprises a fixed transforming which is free of adjustment means.

9. The electron cyclotron resonance apparatus of claim 2 wherein said microwave generating means generates microwave energy at 2.45 gigahertz;

wherein said magnetic field generating means generates a magnetic field at electron cyclotron resonance of 875 Gauss strength;

wherein said plasma in said chamber has a density greater than about 10¹² per cubic centimeter;

wherein said circular polarizing means polarizes the microwave energy in right hand circularly polarized TE₁₁ mode with a radius of 6 cm;

wherein the composition of said window comprises alumina; and

wherein the thickness of said window is 0.98 centimeters.

10. The electron cyclotron resonance apparatus of claim 2 wherein said microwave generating means generates microwave energy at 2.45 gigahertz;

wherein said magnetic field generating means generates a magnetic field at electron cyclotron resonance of 875 Gauss strength;

wherein said plasma in said chamber has a density less than about 3×

10¹¹ per cubic centimeter;

wherein said circular polarizing means polarizes the microwave energy in right hand circularly polarized TE₁₁ mode with a radius of 6 cm;

wherein the composition of said window comprises quartz having dielectric constant of 3.85; and

wherein the thickness of said window is 1.63 centimeter.

11. The method for coupling a microwave source in an electron cyclotron resonance system, the electron cyclotron resonance system including a processing chamber, means for supplying gas to the processing chamber, and means for generating a magnetic field in the processing chamber, the magnetic field causing electrons in the processing chamber to rotate in a first angular direction in electron cyclotron resonance to thereby generate a plasma of the gas in the processing chamber, said method comprising the steps of:

circularly polarizing the microwave energy from the microwave source in the first angular direction and suppressing circularly polarized microwave energy in a second angular direction opposite the first angular direction;

matching the impedance of the circularly polarized microwave energy in the first angular direction to the impedance of the plasma; and

adjusting the magnetic field generating means to minimize remnants of microwave energy which are reflected from the plasma;

wherein said adjustment step comprises the steps of;

measuring the remnants of microwave energy which are reflected from the plasma; and

adjusting the magnetic field generating means to minimize the remnants of the measured reflected microwave energy.

12. The method of claim 11 wherein said impedance matching step comprises the step of directly coupling the circularly polarized microwave energy to the plasma with a quarter wavelength transformer.

13. The method of claim 12 wherein said impedance matching step further comprises the step of directly coupling the circularly polarized microwave energy to the plasma with a quarter wavelength transformer having an impedance equal to the square root of the impedance of the plasma times the impedance of the circularly polarized microwave energy.

14. The method of claim 11 wherein said circularly polarizing step comprises the step of right hand circular polarizing the microwave energy.

15. The method of claim 14 wherein said right hand circular polarizing step comprises the step of right hand circular polarizing the energy from the microwave source into right hand circularly polarized TE₁₁ mode.