Diffraction grating apparatus and method of forming a surface relief pattern in diffraction grating apparatus

• US 5,113,286 A
• Filed: 09/27/1990
• Issued: 05/12/1992
• Est. Priority Date: 09/27/1990
• Status: Expired due to Term

• Current Assignee: American Telephone & Telegraph Company (AT&T, Inc.)
• Original Assignee: AT&T, Inc.
• Inventors: Morrison, Rick L.
• Primary Examiner(s): Arnold, Bruce Y.
• Assistant Examiner(s): NOT, DEFINED
• Application Number:
  US07/589,469
• Time in Patent Office: 593 Days
• Field of Search: 350/3.72, 350/3.73, 350/162.16, 350/162.17, 350/162.2, 350/162.22, 350/162.23, 359/569, 359/571, 359/575
• US Class Current: 359/569
• CPC Class Codes: G02B 27/4233 having a diffractive element [DOE] contributing to a non-imaging application diffusers having a diffractive element G02B5/0252; filters having a diffractive element G02B5/203; systems for controlling the direction of light having diffractive elements G02B26/0808; scanning systems having diffractive elements G02B26/106; beam shaping systems using diffractive optical elements G02B27/0944; beam splitting or combining systems operating by diffraction G02B27/1086
• CPC Class Codes: G02B 5/1857 using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
• CPC Class Codes: G02B 5/1871 Transmissive phase gratings

Abstract

A phase diffraction grating apparatus which is usable to generate an array of N spots, where n is an even integer, and the N spots are substantially equally spaced. The generation of an even number of spots is achieved using a translation symmetry in the grating design. Illustratively, the intensities of the N spots are substantially equal. Binary, multi-level, and continuous phase grating embodiments are disclosed. In the case of the multi-level and continuous embodiments, the uniform intensity is obtained using a reflection symmetry in the grating design.

Claims

1. A phase diffraction grating having a surface relief pattern formed therein such that, when a monochromatic plane wave of light is transmitted to said grating, light is transmitted from said surface relief pattern to form an array of N spots, where N is an even integer and said N spots are substantially equally spaced

where said surface relief pattern comprises two levels and has a set of transitions between said two levels, said set of transitions comprising a plurality of periods of length P, each period comprising a plurality of transitions between said two levels,

such that when said plane wave of light is of wavelength λ

, and said N spots are formed by passing said transmitted light through an objective lens of focal length f, the substantially equal spacing S of said N spots is given by ##EQU50##

2. A grating in accordance with claim 1 wherein said two levels are separated by a phase depth substantially equal to π

.

3. A grating in accordance with claim 1 where said N spots are formed in a line and, with respect to a plurality of orders spaced apart by a spacing 1/2 S and comprising a central order and even and odd orders on each side of said central order, said N spots correspond to said odd orders.

4. A grating in accordance with claim 1 wherein said plurality of transitions comprises transitions in a first half of said each period, and transitions in a second half of said each period obtainable by a translation of said first half period transitions and having a phase offset substantially equal to π

with respect to said first half period transitions.

5. A grating in accordance with claim 1 where said N spots are of substantially equal intensity.

6. A grating in accordance with claim 1 where said N spots are formed by transmitting said plane wave of light through said grating.

7. A grating in accordance with claim 1 where said N spots are formed by reflecting said plane wave of light from said grating.

8. A grating in accordance with claim 1 wherein said surface relief pattern has first and second dimensions such that when said monochromatic plane wave of light is transmitted to said grating, said light transmitted from said surface relief pattern forms a two-dimensional array of N×

M spots comprising lines of N spots in said first dimension and lines of M spots in said second dimension, where M is also an even integer and said M spots are also substantially equally spaced.

9. A grating in accordance with claim 1 wherein said surface relief pattern is obtained using simulated annealing.

10. A phase diffraction grating having a surface relief pattern formed therein such that, when a monochromatic plane wave of light is transmitted to said grating, light is transmitted from said surface relief pattern to form an array of N spots, where N is an even integer and said N spots are substantially equally spaced,

where said surface relief pattern comprises L levels, L being a positive integer greater than two, said surface relief pattern having a set of transitions between ones of said L levels, said set of transitions comprising a plurality of periods of length P, each period comprising a plurality of transitions between ones of said L levels such that when said plane wave of light is of wavelength λ

, and said N spots are formed by passing said transmitted light through an objective lens of focal length f, the substantially equal spacing S of said N spots is given by ##EQU51##

11. A grating in accordance with claim 10 wherein said L levels are separated by a phase depth substantially equal to ##EQU52##

12. A grating in accordance with claim 10 where said N spots are formed in a line and, with respect to a plurality of orders spaced apart by a spacing 1/2 S and comprising a central order and even and odd orders on each side of said central order, said N spots correspond to said odd orders.

13. A grating in accordance with claim 10 wherein said plurality of transitions comprises transitions in a first half of said each period, and transitions in a second half of said each period obtainable by a translation of said first half period transitions and having a phase offset substantially equal to π

with respect to said first half period transitions.

14. A grating in accordance with claim 13 wherein said first half period transitions comprise transitions in a first quarter of said each period, and transitions in a second quarter of said each period obtainable by reflection of said first quarter period transitions about a midpoint of said first half period.

15. A grating in accordance with claim 10 where said N spots are of substantially equal intensity.

16. A grating in accordance with claim 10 where said N spots are formed by transmitting said plane wave of light through said grating.

17. A grating in accordance with claim 10 where said N spots are formed by reflecting said plane wave of light from said grating.

18. A grating in accordance with claim 10 wherein said surface relief pattern has first and second dimensions such that when said monochromatic plane wave of light is transmitted to said grating, said light transmitted from said surface relief pattern forms a two-dimensional array of N×

M spots comprising lines of N spots in said first dimension and lines of M spots in said second dimension, where M is also an even integer and said M spots are also substantially equally spaced.

19. A grating in accordance with claim 10 wherein said surface relief pattern is obtained using simulated annealing.

20. A phase diffraction grating having a surface relief pattern formed therein such that, when a monochromatic plane wave of light is transmitted to said grating, light is transmitted from said surface relief pattern to form an array of N spots, where N is an even integer and said N spots are substantially equally spaced

where said surface relief pattern comprises a continuous surface comprising a plurality of periods of length P such that when said plane wave of light is of wavelength λ

, and said N spots are formed by passing said transmitted light through an objective lens of focal length f, the substantially equal spacing S of said N spots is given by ##EQU53##

21. A grating in accordance with claim 20 where said N spots are formed in a line and, with respect to a plurality of orders spaced apart by a spacing 1/2 S and comprising a central order and even and odd orders on each side of said central order, said N spots correspond to said odd orders.

22. A grating in accordance with claim 20 wherein each of said plurality of periods comprises a first half period, and a second half period obtainable by a translation of said first half period and having a phase offset substantially equal to π

with respect to said first half period.

23. A grating in accordance with claim 22 wherein said first half period comprises a first quarter period, and a second quarter period obtainable by reflection of said first quarter period about a midpoint of said first half period.

24. A grating in accordance with claim 20 where said N spots are of substantially equal intensity.

25. A grating in accordance with claim 20 where said N spots are formed by transmitting said plane wave of light through said grating.

26. A grating in accordance with claim 20 where said N spots are formed by reflecting said plane wave of light from said grating.

27. A grating in accordance with claim 20 wherein said surface relief pattern has first and second dimensions such that when said monochromatic plane wave of light is transmitted to said grating, said light transmitted from said surface relief pattern forms a two-dimensional array of N×

M spots comprising lines of N spots in said first dimension and lines of M spots in said second dimension, where M is also an even integer and said M spots are also substantially equally spaced.

28. A grating in accordance with claim 20 wherein said surface relief pattern is obtained using simulated annealing.

29. Optical spot-generating apparatus comprising

means for generating a monochromatic plane wave of light of wavelength λ

,

an objective lens of focal length f, and

a phase diffraction grating responsive to said plane wave of light and having a surface relief pattern comprising a plurality of periods of length P for transmitting light from said surface relief pattern through said lens to form an array of N spots, where N is an even integer and said N spots are substantially equally spaced at a spacing S given by ##EQU54##

30. Apparatus comprising

an objective lens of focal length f, and

a phase diffraction grating responsive to a monochromatic plane wave of light of wavelength λ

, said grating having a surface relief pattern comprising a plurality of periods of length P for transmitting light from said surface relief pattern through said lens to form an array of N spots, where N is an even integer and said N spots are substantially equally spaced at a spacing S given by ##EQU55##

31. A method of forming a surface relief pattern in a phase diffraction grating such that when a monochromatic plane wave of light is transmitted to said grating, light is transmitted from said surface relief pattern to form an array of N spots, where N is an even integer and said N spots are substantially equally spaced, said method comprising

forming first half periods of a plurality of periods of length P which comprise said surface relief pattern, and

forming second half periods of said plurality of periods, said second half periods obtained by a translation of said first half periods and having a phase offset substantially equal to π

with respect to said first half periods.

32. A method in accordance with claim 31 wherein said surface relief pattern comprises two levels and has a set of transitions between said two levels, each of said plurality of periods comprising a plurality of transitions between said two levels, said forming said first half periods comprising

forming transitions in said first half periods, and said forming said second half periods comprising

forming transitions in said second half periods, said transitions in said second half periods obtained by a translation of said first half period transitions and having a phase offset substantially equal to π

with respect to said first half period transitions.

33. A method in accordance with claim 31 wherein said surface relief pattern comprises L levels, L being a positive integer greater than two, each of said plurality of periods comprising a plurality of transitions between ones of said L levels, said forming said first half periods comprising

forming transitions in said first half periods, and said forming said second half periods comprising

forming transitions in said second half periods, said transitions in said second half periods obtained by a translation of said first half period transitions and having a phase offset substantially equal to π

with respect to said first half period transitions.

34. A method in accordance with claim 33 wherein said forming transitions in said first half periods comprises

forming transitions in first quarter periods of said first half periods, and

forming transitions in second quarter periods of said first half periods, said second quarter period transitions obtained by reflection of said first quarter period transitions about midpoints of said first half periods.

35. A method in accordance with claim 31 wherein said surface relief pattern comprises a continuous surface, said forming said first half periods comprising

forming first quarter periods of said first half periods, and

forming second quarter periods of said first half periods obtained by reflection of said first quarter periods about midpoints of said first half periods.