Apparatus and method for inspection and alignment of semiconductor chips and conductive lead frames

• US 5,113,565 A
• Filed: 07/06/1990
• Issued: 05/19/1992
• Est. Priority Date: 07/06/1990
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Cipolla, Thomas M., Oden, Christopher W., Coteus, Paul W., Murphy, Philip, Johnson, Glen W.
• Primary Examiner(s): Chaudhuri, Olik
• Assistant Examiner(s): Graybill, David E.
• Application Number:
  US07/549,577
• Time in Patent Office: 683 Days
• Field of Search: 358/101, 358/107, 382/8, 228/102, 228/103, 228/180.2, 228/6.2, 228/7, 228/9, 228/49.1, 437/220, 437/206, 437/8, 29/827, 29/740, 29/833, 29/834, 29/25.01
• US Class Current: 29/25.01
• CPC Class Codes: H01L 21/67144 Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
• CPC Class Codes: H01L 22/12 for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions electrical measurement of diffusions H01L22/14
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
• CPC Class Codes: Y10T 29/49121 Beam lead frame or beam lead device
• CPC Class Codes: Y10T 29/49131 by utilizing optical sighting device
• CPC Class Codes: Y10T 29/49133 with component orienting
• CPC Class Codes: Y10T 29/53178 Chip component

Abstract

A method is described for aligning a contact pattern on an electronic device held by a first movable support, with a bond site pattern on a lead frame held by a second movable support. The method includes the steps of: (a) creating and storing models of a chip'"'"'s contact pattern and a lead frame'"'"'s bond site pattern; (b) imaging the electronic device and lead frame; (c) determining the position of contacts on said electronic device and reorienting the contact pattern model to a best fit with the imaged contact position; (d) determining the position of each bond site on the imaged lead frame and reorienting the bond site model to a best fit with the imaged bond site position; (e) determining positional differences between the reoriented lead frame and contact pattern models; and (f) generating signals to reorient the first and second movable supports to minimize the positional differences when they are moved into a bonding positon. A machine is described for performing the above method wherein each of three main movable elements of the machine is assigned a dimensional axis in which its travel is non-adjustable, so that other movable elements can be calibrated thereagainst.

Claims

1. A method for aligning a contact pattern on an electronic device held by a first movable support, with a bond site pattern on a lead frame held by a second movable support, comprising the steps of:

a. creating and storing precise models of contact and bond site patterns;

b. deriving images of said electronic device contact pattern and said lead frame, said electronic device and lead frame to be hereafter moved by said first and second movable supports into a bonding position to enable said electronic device contact pattern to be bonded to bond sites on said lead frame;

c. determining the position of contacts in said imaged contact pattern, and reorienting said contact pattern model to a best fit with said determined contact positions;

d. determining the position of bond sites on said imaged lead frame, and reorienting said bond site model to a best fit with said determined bond site positions;

e. finding positional differences between said reoriented bond site and contact pattern models; and

f. generating signals to reorient said first and second movable supports to minimize said positional differences when said first and second supports are moved into said bonding position.

2. The method as defined in claim 1 wherein said deriving step (b) includes storing a plurality of gray scale value pels which comprise said images, said pels having dimensions that are larger than dimensional resolutions required by said method, said step (d) further comprising the sub-steps of:

d1. illuminating said lead frame to render leads therein in shadow;

d2. finding pels close to a bond site;

d3. determining the slope of gray scale value change of said close pels to find a pel whose change is a first value and is adjacent a second pel whose change is either zero or a second opposite sign value to said first value; and

d4. interpolating between said close pels to determine a position where said slope change of gray scale value is approximately zero and is indicative of a light minima and assigning that position as a bond site.

3. The method as defined in claim 2 wherein, subsequent to said step d4, the method further comprises:

d5. deriving from said determined bond sites, a center and angular orientation of said imaged lead frame.

4. The method as defined in claim 3, wherein subsequent to said step (d5), the method further comprises the step of:

d6. determining if either said derived center or angular orientation of said imaged lead frame differs by more than predetermined limits from said bond site model center or angular orientation, and if not;

d7. reorienting said bond site model by moving its center and angular orientation to match that of said imaged lead frame.

5. The method as defined in claim 4 wherein said illumination of said lead frame causes individual beam-leads to be imaged as dark, gray scale value pels.

6. The method as defined in claim 1, wherein said deriving step (b) includes storing a plurality of gray scale value pels which comprise said images, said pels having dimensions that are larger than dimensional resolutions required by said method, said step (c) further comprising the steps of:

c1. illuminating said contact pattern so as to render spaces therebetween in shadow;

c2. finding pels intermediate a pair of contacts;

c3. determining the slope of gray scale value change of said found pels to find one whose change of gray scale is a first value and is adjacent a second pel whose slope change of gray scale value is either zero or a second opposite-sign value to said first value;

c4. interpolating between said found pels to determine a position where said slope change of gray scale value is approximately zero and indicates a light minima; and

c5. determining from said position, adjacent contact center positions of said imaged contact pattern.

7. The method as defined in claim 6 wherein subsequent to said step c5, the method further comprises the steps of:

c6. deriving from said determined contact center positions, a center and angular orientation of said imaged contact pattern.

8. The method as defined in claim 7 wherein subsequent to said step c6, the method further comprises the steps of:

c7. determining if either said center or angular orientation of said imaged contact pattern differs by more than predetermined limits, from said center or angular orientation of said contact pattern model, and if not;

c8. reorienting said contact pattern model by moving its center and angular orientations to match that of said imaged contact pattern.

9. The method as defined in claim 6, wherein each contact in said contact pattern is configured as a raised bump, and said illuminating step c1 is accomplished by directing a light beam parallel to the surface of said electronic device.

10. The method as defined in claim 9 wherein said step b further comprises the step of:

b1. convolving image pels of said electronic device by employing a site enhancement multi-pel kernel and sequencing said kernel through said image pels, multiplying values of said kernel pels by gray scale values of said image pels and accumulating products of said kernel pel multiplications for each said image pel.

11. The method as defined in claim 6 wherein said step (c) further comprises the steps of:

c9. locating an approximate site of a pivot point in said imaged contact pattern;

c10. using a pivot point kernel, finding a pel in said imaged contact pattern corresponding to said pivot point;

c11. placing a chip angle kernel at said pivot point and determining an orientation angle of said imaged contact pattern using said kernel; and

c12. orienting said contact pattern model coincident with said determined, imaged contact pattern pivot point and orientation angle.

12. The method as defined in claim 1 wherein step (e) further comprises:

e1. finding a maximum positional difference on each side of a lead frame;

e2. translating said bond site model to minimize said maximum positional differences; and

e3. rotating said bond site model to further reduce said maximum positional differences.

13. The method as defined in claim 12 wherein step (e) further comprises:

e4. correcting for parallax errors resulting from offsets in leads in said lead frame by extracting a contribution to said error which grows in proportion to a lead'"'"'s position in relation to an imaging camera.

14. The method as defined in claim 1 further comprising the steps of:

g. averaging positional differences found in step (e) over N imaged lead frames and electronic devices; and

h. adjusting the movement of said second movable support to minimize said averaged positional difference.

15. An apparatus for bonding contact areas of an electronic device to one of a plurality of lead frames, each said lead frame having a plurality of bond sites and first and second surfaces, said apparatus comprising;

advancing means for moving a lead frame into a bonding position, said advancing means being adjustably movable along a first axis but fixed along a second orthogonal axis;

support means for holding said electronic device so that its contact areas are disposed towards said first surface of said lead frame, said support means adjustably translatable both along said first and second axes and non-adjustably translatable along a third orthogonal axis which is perpendicular to said lead frame surfaces, said support means further adjustably rotatable about said third axis;

anvil means disposed along said third axis opposite said second surface of said lead frame, said anvil means fixed in said first axis, but adjustably translatable along said second and third axes;

optical means for imaging said advancing and support means;

processor means responsive to said optical means, for determining positional differences between bond sites on a lead frame and contact areas on an electronic device, and causing movements of said support means and advancing means on axes along which said means are respectively, adjustably translatable or rotatable, to reduce said positional differences, whereby reliable bonding is enabled to occur.

16. The apparatus as recited in claim 15, wherein said processor means, based upon positional errors determined between a bond site model and an imaged lead frame, controls said advancing means to alter its advancing action along said first axis to adjust the positioning of a group of succeeding lead frames.

17. The apparatus as recited in claim 16 wherein said processor means, alters the position of a bond site model to coincide with the position of an imaged lead frame.

18. The apparatus as recited in claim 17, wherein said processor means, in response to a comparison which indicates a fault between an imaged lead frame and said bond site model, causes any bonding action to be aborted and said advancing means to move another lead frame into said bonding position.

19. The apparatus as recited in claim 18, wherein said processor means, in response to positional errors determined between an imaged electronic device contact pattern and a model of said contact pattern, causes said model to alter its position by translating it along said first and second axes and rotating it about said third axis, all to reduce said positional errors to a minimum.

20. The apparatus recited in claim 19, further including transport means for moving electronic devices from a supply to said support means, said processor means, upon determining that positional errors between said imaged electronic device contact pattern and said contact pattern model exceed a threshold, causes said transport means to replace said electronic device with another.

21. The apparatus as recited in claim 20 wherein said processor means determines positional misalignments between said altered position bond site model and said model, and employs said positional error to reposition said advancing means and support means to compensate for said positional misalignments.

22. The apparatus as recited in claim 21 wherein said electronic device'"'"'s bonding contact areas are raised bumps and wherein said optical means for imaging said support means illuminates said bumps with light beams which are parallel to a surface of said electronic device from which said bumps protrude.