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Plasma processor

  • US 5,115,167 A
  • Filed: 04/04/1989
  • Issued: 05/19/1992
  • Est. Priority Date: 04/05/1988
  • Status: Expired due to Term
First Claim
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1. A plasma processor comprising a chamber including a cylindrical plasma generation portion in which an electron cyclotron resonance plasma is generated, means for producing a magnetic field in said plasma generation portion for establishing the electron cyclotron resonance plasma, means for supplying a gas to the plasma generation portion in which the electron cyclotron resonance plasma is established, and means for producing right hand polarized microwave energy and for supplying the right hand polarized microwave energy and for supplying the right hand polarized microwave energy to said plasma generation portion including a magnetron oscillator and a circular cross-section waveguide interposed between said magnetron oscillator and said plasma generation portion for transmitting right hand polarized microwave energy, said chamber including a plasma reaction portion for retaining a substrate to be processed with the plasma generated in said plasma generation portion, wherein said cylindrical plasma generation portion and said circular waveguide each have diameters, and the diameter of said plasma generation portion is larger than the diameter of said circular waveguide.

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