Position measuring apparatus utilizing two-beam interferences to create phase displaced signals

• US 5,120,132 A
• Filed: 11/01/1990
• Issued: 06/09/1992
• Est. Priority Date: 11/02/1989
• Status: Expired due to Term

• Current Assignee: Dr. Johannes Heidenhain GmbH
• Original Assignee: Dr. Johannes Heidenhain GmbH
• Inventors: Teimel, Arnold, Spies, Alfons
• Primary Examiner(s): McGraw, Vincent P.
• Assistant Examiner(s): KURTZ, RICHARD
• Application Number:
  US07/607,997
• Time in Patent Office: 586 Days
• Field of Search: 356/356, 356/354, 356/363, 356/374, 250/237 G, 250/231.13
• US Class Current: 356/499
• CPC Class Codes: G01D 5/38 by diffraction gratings

Abstract

A phase grating is provided in this length or angle measuring apparatus, which operates by interference. A beam striking the phase grating from a laser is diffracted into ±1st order beams at the phase grating. The diffracted ±1st order beams are reflected at retroreflecting elements and, diffracted once again at the phase grating, and made to interfere in pairs. The modulations in intensity of the two-beam interferences are converted by detectors into electrical signals that are phase-displaced from one another. The diffraction grating is configured such that at least one partial beam cluster of the zero order of diffraction is involved in the formation of at least one of the two-beam interferences.

Claims

1. An apparatus for measuring the relative position of two objects comprising:

an illumination source;

a detector attached to one of the two objects;

a measuring graduation in the form of a diffraction grating attached to the other object wherein a light beam emitted from said source is diffracted into partial beam clusters;

deflection means for deflecting said partial beam clusters onto said measuring graduation wherein said partial beam clusters are diffracted once again so that a two-beam interference is created; and

at least one detector for detecting and converting the modulation in the intensity of said two-beam interference into an electrical signal,

said diffraction grating being configured such that at least one partial beam cluster of the zero order of diffraction is involved at least in the formation of one of the two-beam interferences, and that the modulations that occur in the two-beam interference upon a motion of the measuring graduation in the measuring direction are phase-displaced relative to one another.

2. The apparatus according to claim 1 wherein said deflection means comprises a retroreflecting element.

3. The apparatus according to claim 2 wherein said retroreflecting element comprises a triple prism.

4. The apparatus according to claim 2 wherein said retroreflecting element comprises a triple mirror.

5. The apparatus according to claim 1 wherein said deflection means comprise plane mirrors.

6. The apparatus according to claim 1 wherein said deflection means comprise deflection prisms for an angle encoding apparatus.

7. The apparatus according to claim 1 wherein said deflection means comprise a dove prism, which is preceded and followed by one deflection grating for an angle encoding apparatus.

8. The apparatus according to claim 1 wherein said detector comprises at least two photoelements, and wherein said at least two photoelements are configured such that they convert at least two two-beam interferences into two electrical signals phase-displaced from one another.

9. The apparatus according to claim 1 wherein one single measuring graduation comprises the diffraction grating.

10. The apparatus according to claim 1 wherein the subregions of the phase grating each have different physical properties, for splitting and uniting the beam clusters.

11. The apparatus according to claim 1 wherein the interfering orders of diffraction are selected such that the period of the electrical signals comprises one-fourth the graduation period of the measuring graduation.

12. The apparatus according to claim 8 wherein the interfering orders of diffraction are selected such that the period of the electrical signals comprises one-fourth the graduation period of the measuring graduation.

13. The apparatus according to claim 1 wherein the interfering orders of diffraction are such that the period of the electrical signals comprises one-half the graduation period of the measuring graduation.

14. The apparatus according to claim 8 wherein the interfering orders of diffraction are such that the period of the electrical signals comprises one-half the graduation period of the measuring graduation.