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Lithography system employing a solid immersion lens

  • US 5,121,256 A
  • Filed: 03/14/1991
  • Issued: 06/09/1992
  • Est. Priority Date: 03/14/1991
  • Status: Expired due to Fees
First Claim
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1. In a lithography system of the type which includes a lens system for imaging a mask onto a sample, the improvement comprising placing a solid immersion lens placed closely adjacent to the sample, said solid immersion lens being constructed of a material having a high refractive index and shaped with a spherical surface facing said lens system and a flat front surface adjacent to said sample.

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