Acrylic polymer coating compositions for coats and films that have reduced surface resistivity

• US 5,124,381 A
• Filed: 11/08/1990
• Issued: 06/23/1992
• Est. Priority Date: 11/08/1990
• Status: Expired due to Fees

• Current Assignee: Armstrong World Industries Incorporated
• Original Assignee: Armstrong World Industries Incorporated
• Inventors: Ward, Harry D.
• Primary Examiner(s): Schofer, Joseph L.
• Assistant Examiner(s): SMITH, JEFFREY
• Application Number:
  US07/610,794
• Time in Patent Office: 593 Days
• Field of Search: 524/247, 524/249, 524/114
• US Class Current: 524/114
• CPC Class Codes: C08K 5/175 containing COOH-groups; Esters or salts thereof
• CPC Class Codes: C08L 2666/28 Non-macromolecular organic substances
• CPC Class Codes: C08L 2666/54 Inorganic substances
• CPC Class Codes: C08L 33/02 Homopolymers or copolymers of acids; Metal or ammonium salts thereof
• CPC Class Codes: C09D 133/02 Homopolymers or copolymers of acids; Metal or ammonium salts thereof

Abstract

Coating compositions for making films having reduced surface resistivity are described herein. These compositions are clear and produce films that are clear and transparent enough to read newsprint through the films. The compositions include colloidal silica, a choline based antistat, and a film-forming binder which is a (meth)acrylic polymer having a quaternary ammonium salt moiety in the polymeric molecule.

Claims

1. Coating compositions which produce clear film coatings with reduced surface resistivities from 10⁶ to 10¹² ohm/square comprising a choline based antistate in an amount of at least about 5% by weight, colloidal silica in an amount less than about 30% by weight, and a film-forming binder which is an acrylic or methacrylic polymer having a quaternary ammonium salt moiety in the polymeric molecule wherein the said quaternary ammonium moiety is present in the polymer at an amount of from about 5 to about 45 mole percent and a solvent-carrier material.

2. The composition of claim 1 wherein the polymer, colloidal silica, and the antistat have a percent solids total which will make a film that is at least about 22% polymer.

3. The composition of claim 1 wherein the polymer is water insoluble.

4. The composition of claim 3 wherein the polymer contains from about 5 to about 12 mole% of the quaternary ammonium salt moiety.

5. The composition of claim 1 wherein the polymer has a number average molecular weight of at least about 2,000.

6. The composition of claim 1 wherein the choline antistat is selected from the group consisting of 2,3-epoxy propyl trimethylammonium chloride, 3-chloro-2-hydroxy propyl trimethylammonium chloride, 3-trimethyl ammonium-1-propanol methyl sulfate, choline chloride and choline methyl sulfate.

7. The composition of claim 1 wherein the colloidal silica is non-aqueous, or low-water.

8. The coating composition of claim 1 wherein the choline based antistat is present at an amount in the range of from about 5 to about 20% by weight.

9. The coating composition of claim 1 wherein the polymer is present in an amount of from about 9 to about 90% by wt.

10. The coating composition of claim 1 wherein the choline based antistat is present at an amount less than about 9% by weight.

11. The coating composition of claim 1 wherein the percent transmittance is at least about 75% or greater at 400 nm of light.

12. The coating composition of claim 1 with less than about 3% by weight of water.

13. A coating composition which produces clear film coatings with reduced surface resistivities from 10⁶ to 10¹² ohm/square comprising a choline based antistat in an amount of from about 5 to about 9% by weight, colloidal silica in an amount of from about of from about 5 to about 30% by weight, and a film-forming binder which is an acrylic or methacrylic polymer having a quaternary ammonium salt moiety in the polymeric molecule wherein the said quaternary ammonium moiety is present in the polymer at an amount of from about 5 to about 45 mole percent and a solvent-carrier material, wherein further, the coating composition has a percent transmittance that is about 47% or greater at 400 nanometers of light.