Semiconductor device having a particular structure allowing for voltage stress test application
First Claim
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1. A semiconductor device comprising:
- a semiconductor wafer having a plurality of IC chip regions;
a plurality of first wiring layers formed on said semiconductor wafer and coupled in common to said IC chip regions;
a plurality of memory circuits, each being provided in one of said IC chip regions and each including at least one word line and at least one bit line; and
a plurality of switching means, each being provided in one of said IC chip regions, for rendering in an ON state a connection between word lines of said memory circuits and said first wiring layers and a connection between bit lines of said memory circuits and said first wiring layers during a voltage stress test.
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Abstract
Since the power-supply and/or signal-transmission wiring layers connected to the semiconductor chip regions are formed, each individual integrated circuit can be burned in on the semiconductor wafer and, in other words, an integrated circuit can be burned in on a wafer level. The integrated circuit can thus be burned in at the end of a wafer process. An assembled semiconductor device is subjected to a high temperature or a high humidity, for checking the reliability of the assembled device.
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Citations
22 Claims
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1. A semiconductor device comprising:
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a semiconductor wafer having a plurality of IC chip regions; a plurality of first wiring layers formed on said semiconductor wafer and coupled in common to said IC chip regions; a plurality of memory circuits, each being provided in one of said IC chip regions and each including at least one word line and at least one bit line; and a plurality of switching means, each being provided in one of said IC chip regions, for rendering in an ON state a connection between word lines of said memory circuits and said first wiring layers and a connection between bit lines of said memory circuits and said first wiring layers during a voltage stress test. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A semiconductor device comprising:
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a semiconductor wafer having a plurality of IC chip regions; a plurality of dynamic memory circuits, each being provided in said IC chip regions; two power supply lines, arranged on said semiconductor wafer and coupled in common to said dynamic memory circuits, for application of a power supply voltage and a ground potential; and two signal lines, arranged on said semiconductor wafer and coupled in common to said dynamic memory circuits, for supply of a RAS (row address strobe) signal and a CAS (column address strobe) signal. - View Dependent Claims (13, 14, 15, 16, 17, 21, 22)
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- 18. A semiconductor device according to claim 36, wherein said two power supply lines and said two signal lines are formed by patterning a wiring layer different from that from which second wiring layers used in said IC chip regions are formed by patterning.
Specification