Semiconductor device which relieves internal stress and prevents cracking
First Claim
1. A semiconductor device for relieving stress and preventing cracking, comprising:
- a semiconductor thin film;
first and second insulator films provided in such arrangement that said semiconductor thin film is sandwiched therebetween and each contains a constituent element of said semiconductor thin film; and
means for relieving internal stress and preventing cracking, said relieving and preventing means including first and second multilayered graded layers each having a plurality of respective insulating thin films each containing the constituent element of said semiconductor thin film and a constituent element of said insulator films deposited therein so that a content of the constituent element of the insulator films in said insulating thin films decreases in the direction of said semiconductor thin film, said first and second multilayered graded layers each being interposed between said semiconductor thin film and a respective one of said insulator films.
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Accused Products
Abstract
A semiconductor device according to the present invention comprises a semiconductor thin film, and first and second insulator films formed in such arrangement that the semiconductor thin film being sandwiched therebetween. First and second graded layers each containing a constitutent element of the semiconductor thin film and impurities and having a content of the impurities decreased in the direction of the semiconductor thin film are interposed between the semiconductor thin film and the respective insulator films, thereby to relax internal stress produced in the junction interfaces of the semiconductor thin film and the insulator films and to prevent cracking from occurring in the junction interfaces.
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Citations
10 Claims
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1. A semiconductor device for relieving stress and preventing cracking, comprising:
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a semiconductor thin film; first and second insulator films provided in such arrangement that said semiconductor thin film is sandwiched therebetween and each contains a constituent element of said semiconductor thin film; and means for relieving internal stress and preventing cracking, said relieving and preventing means including first and second multilayered graded layers each having a plurality of respective insulating thin films each containing the constituent element of said semiconductor thin film and a constituent element of said insulator films deposited therein so that a content of the constituent element of the insulator films in said insulating thin films decreases in the direction of said semiconductor thin film, said first and second multilayered graded layers each being interposed between said semiconductor thin film and a respective one of said insulator films. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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Specification