Methods for manufacturing solid state ionic devices

• US 5,171,413 A
• Filed: 09/16/1991
• Issued: 12/15/1992
• Est. Priority Date: 09/16/1991
• Status: Expired due to Fees

• Current Assignee: Tufts University
• Original Assignee: Tufts University
• Inventors: Arntz, Floyd O., Goldner, Ronald B., Haas, Terry E., Wei, Guang, Wong, Kwok-Keung
• Primary Examiner(s): Nguyen, Nam X.
• Application Number:
  US07/760,445
• Time in Patent Office: 456 Days
• Field of Search: 204/192.15, 204/192.26, 204/192.27, 204/192.28, 204/192.29
• US Class Current: 204/192.15
• CPC Class Codes: C23C 14/08 Oxides C23C14/10 takes precedence
• CPC Class Codes: C23C 14/088 of the type ABO3 with A representing alkali, alkaline earth metal or Pb and B representing a refractory or rare earth metal
• CPC Class Codes: C23C 14/48 Ion implantation
• CPC Class Codes: C23C 14/58 After-treatment
• CPC Class Codes: C23C 14/5826 Treatment with charged particles C23C14/582 takes precedence
• CPC Class Codes: C23C 14/5893 Mixing of deposited material
• CPC Class Codes: G02F 1/1525 characterised by a particular ion transporting layer, e.g. electrolyte
• CPC Class Codes: H01M 10/0562 Solid materials
• CPC Class Codes: Y02E 60/10 Energy storage using batteries

Abstract

A multilayer, thin film solid state ionic device usable as an electrochromic window and/or as a rechargeable battery and a method for its manufacture. In one embodiment, the device comprises a transparent substrate and a thin film, five layered coating, the coating being deposited onto the substrate. The device is made by depositing a first layer of indium tin oxide onto the substrate, depositing a second layer of tungsten trioxide onto the first layer, inserting a quantity of lithium ions into the second layer so as to form a lithium-enriched second layer, depositing a third layer of lithium niobate onto the lithium-enriched second layer, sputter depositing a fourth layer of LiCoO₂ onto the third layer, whereby the fourth layer is lithium-deficient, applying, in the presence of a plasma, a sufficiently large positive electrical potential to the second layer so as to cause virtually all of the lithium ions inserted thereinto to be expelled therefrom, whereby a quantity of lithium ions are added to the fourth layer to ameliorate its lithium deficiency and whereby any lithium ions expelled from the second layer but not needed to cure the deficiency of lithium ions in the fourth layer are expelled into the plasma, and then depositing a fifth layer made of indium oxide onto said fourth layer.

Claims

1. A method for preparing a multilayer thin film solid state ionic device comprising the steps of:

a) providing a substrate;

b) depositing a first layer including one or more electron-conductive, lithium-resistive materials onto said substrate;

c) depositing a second layer including one or more electron-conductive, lithium-conductive materials onto said first layer;

d) inserting a quantity of lithium ions into said second layer so as to form a lithium-enriched second layer;

e) depositing a third layer including one or more electron-resistive, lithium-conductive materials onto said lithium-enriched second layer;

f) sputter depositing onto said third layer a fourth layer including one or more electron-conductive, lithium-conductive materials having the formula Li_y MO₂ wherein M is a transition metal of the third, fourth, or fifth row of the periodic table, whereby said fourth layer is lithium-deficient;

g) applying, in the presence of a plasma, a positive electrical potential to said second layer until virtually all of the lithium ions present therein are expelled therefrom, whereby a number of lithium ions are added to said fourth layer, said number of lithium ions added to said fourth layer not exceeding the number of lithium ions needed to cure the lithium-deficiency therein; and

h) depositing a fifth layer including one or more electron-conductive, lithium-resistive materials onto said fourth layer.

2. The method as claimed in claim 1 wherein said plasma is a non-lithium enriched plasma and wherein the lithium ions added to said fourth layer are transferred thereto solely from said second layer.

3. The method as claimed in claim 2 wherein said plasma is struck using a target material selected from the group consisting of silicon carbide, aluminum, lithium carbonate, and lithium cobalt dioxide.

4. The method as claimed in claim 2 wherein said applying step is performed at a temperature of about 15-30 degrees C.

5. The method as claimed in claim 1 wherein said step of sputter depositing said fourth layer is performed at a temperature of about 15-30 degrees C.

6. The method as claimed in claim 1 wherein said steps of inserting lithium into said second layer, depositing said third layer, and sputter depositing said fourth layer are performed with said substrate and any layers deposited thereonto kept electrically floating.

7. The method as claimed in claim 1 wherein said step of sputter depositing said fourth layer comprises sputter depositing one or more materials having the formula Li_y MO₂ wherein M is a transition metal of the third row of the periodic table.

8. The method as claimed in claim 7 wherein said step of sputter depositing said fourth layer comprises sputter depositing LiCoO₂.

9. The method as claimed in claim 1 wherein said step of inserting lithium into said second layer comprises sputtering lithium carbonate thereonto.

10. The method as claimed in claim 1 wherein said step of depositing said fifth layer is performed using reactive vapor deposition at elevated temperatures.

11. The method as claimed in claim 1 wherein said steps of sputter depositing said fourth layer and depositing said fifth layer are performed with masks so that said fourth layer is pyramided relative to said third layer and said fifth layer is pyramided relative to said fourth layer.

12. The method as claimed in claim 1 wherein said fourth layer is sputter deposited from a target of Li_y MO₂ powder enriched with Li₂ CO₃ powder.

13. The method as claimed in claim 1 wherein said plasma is a lithium-enriched plasma and wherein the lithium ions added to said fourth layer are transferred both from said second layer and from said lithium-enriched plasma.

14. The method as claimed in claim 1 further comprising, after the step of applying said positive electrical potential in the presence of a plasma and before the step of depositing said fifth layer, annealing said substrate and any layers deposited thereonto at about 300 degrees C. under vacuum conditions.

15. A method for preparing a multilayer thin film solid state ionic device comprising the steps of:

a) providing a substrate including one or more electron-conductive, lithium-conductive materials;

b) inserting a quantity of lithium ions into said substrate so as to form a lithium-enriched substrate;

c) depositing a first layer including one or more electron-resistive, lithium-conductive materials onto said substrate;

d) sputter depositing onto said first layer a second layer including one or more electron-conductive, lithium-conductive materials having the formula Li_y MO₂ wherein M is a transition metal of the third, fourth, or fifth row of the periodic table, whereby said second layer is lithium-deficient;

e) applying, in the presence of a plasma, a positive electrical potential to said second layer until virtually all of the lithium ions present therein are expelled therefrom, whereby the lithium-deficiency of said second layer is ameliorated; and

f) depositing a third layer including one or more electron-conductive, lithium-resistive materials onto said second layer.

16. A method for preparing a multilayer thin film solid state ionic device comprising the steps of:

(a) providing a substrate;

(b) after step (a), depositing a layer of one or more electron-conductive, lithium-resistive materials;

(c) after step (b), depositing a layer of one or more electron-conductive, lithium-conductive materials;

(d) after step (c), inserting a quantity of lithium ions into the layer deposited in step (c);

(e) after step (d), depositing a layer of one or more electron-resistive, lithium-conductive materials;

(f) after step (e), sputter depositing a layer of one or more electron-conductive, lithium-conductive materials having the formula Li_y MO₂ wherein M is a transition metal of the third, fourth, or fifth row of the periodic table;

(g) after step (f), applying, in the presence of a plasma, a positive electrical potential to said second layer so as to cause at least some of the lithium ions inserted thereinto to be expelled therefrom; and

(h) after step (g), depositing a layer of one or more electron-conductive, lithium-resistive materials.