Process and apparatus for dry sterilization of medical devices and materials

• US 5,171,525 A
• Filed: 08/03/1990
• Issued: 12/15/1992
• Est. Priority Date: 02/25/1987
• Status: Expired due to Term

• Current Assignee: Adir Jacob
• Original Assignee: Adir Jacob
• Inventors: Jacob, Adir
• Primary Examiner(s): Housel, James C.
• Assistant Examiner(s): ALEXANDER, LYLE
• Application Number:
  US07/562,392
• Time in Patent Office: 865 Days
• Field of Search: 422/22-23, 422/28, 422/33, 422/36-37, 422/906-907, 422/292, 422/304, 204/164, 204/295, 250/424, 250/455.1, 250/492.1, 250/496.1
• US Class Current: 422/23
• CPC Class Codes: A61L 2/14 Plasma, i.e. ionised gases
• CPC Class Codes: Y10S 422/906 Plasma or ion generation means
• CPC Class Codes: Y10S 422/907 Corona or glow discharge means

Abstract

A process for dry sterilization of medical or dental devices and materials in which these materials are subjected to an electrical discharge in a gaseous atmosphere to produce an active low temperature plasma for surface sterilization and treatment of the devices and materials.

Claims

1. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials on a generally planar metallic electrode, said planar electrode being positioned within a gas-tight confining chamber, said chamber being made of metal and connected to a point of potential reference, the internal surface area of said chamber being substantially larger than the surface area of said planar electrode,

further including a perforated metallic enclosure within said chamber, said perforated enclosure being insulated from, but surrounding and containing said planar electrode and said devices and materials positioned thereon, said enclosure being connected to said point of potential reference,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber wherein said gas comprises water vapor in excess of 100 ppm in a binary mixture with any one of the groups of gases consisting of oxygen, nitrogen, argon or a halogen,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said planar electrode and said point of potential reference creating a gas plasma,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber, and

withdrawing said devices and materials from said chamber.

2. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials within a first metallic perforated electrode, said electrode being positioned within, and spaced from a fluid cooled metallic gas-tight confining chamber with a wall connected to a point of potential reference,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

wherein said gas is selected from the group consisting of, an oxidizing gas, a reducing gas, and a gaseous mixture of oxygen and any one of the gases consisting of, nitrogen, argon, helium or halogen,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said internal perforated electrode and the chamber wall, creating a gas plasma accompanied by a substantially field free and glowless volume within the perforated electrode containing said devices and materials, whereby said devices and materials are contacted by substantially electrically neutral active species at a temperature below that which would be detrimental to said devices and materials,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber;

and

withdrawing said devices and materials from said chamber.

3. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials on a generally planar metallic electrode, said electrode being positioned within a gas-tight fluid cooled confining chamber, said chamber being made of metal and connected to a point of potential reference, the internal surface area of said chamber being substantially larger than the surface area of said planar electrode,

further including a perforated metallic enclosure within said chamber, said perforated enclosure being insulated from, but surrounding and containing said planar electrode and said devices and materials positioned thereon, said enclosure being connected to said point of potential reference,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said planar electrode and said point of potential reference creating a gas plasma,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber;

and

withdrawing said devices and materials from said chamber.

4. Apparatus for sterilization and treatment of medical and dental devices and materials in a gas plasma comprising,

a gas-tight confining chamber having a metallic wall, said chamber wall being connected to a point of potential reference,

a fluid cooled internal planar electrode positioned within said chamber,

a perforated metallic enclosure insulated from, and containing said planar electrode, said perforated metallic enclosure being connected to said point of potential reference,

means for applying an RF voltage between said planar electrode and said point of potential reference,

means for connecting to and evacuating said chamber, and

means for connecting to and flowing gas through said chamber.

5. Apparatus in accordance with claim 4 wherein said gas-tight confining chamber is fluid cooled.

6. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials within a first perforated metallic electrode, said electrode being positioned within, and spaced from a gas-tight confining chamber with a wall, said chamber being formed of metal and connected to a point of potential reference,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said perforated metallic electrode and the metallic chamber wall, creating a gas plasma accompanied by a field-free and glowless volume within the perforated electrode containing said devices and materials, whereby said devices and materials are contacted by substantially electrically neutral active species at a temperature below that which would be detrimental to said devices and materials,

wherein said gas comprises water vapor in excess of 100 ppm in a binary mixture with any one of the groups of gases consisting of, oxygen, nitrogen, argon or a halogen,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber;

and

withdrawing said devices and materials from said perforated electrode within said chamber.

7. A method in accordance with claim 6 wherein said devices and materials are enclosed within sealed pouches formed of gas permeable materials while in said chamber.

8. Apparatus for sterilization and treatment of medical and dental devices and materials in a gas plasma comprising,

a gas-tight confining chamber with a wall,

a first liquid cooled perforated metallic electrode positioned within and spaced from said chamber wall,

means for applying an RF voltage between said perforated electrode and said chamber wall,

means for connecting to and evacuating said gas-confining chamber,

means for connecting to and flowing gas through said chamber, and

a liquid cooling system fluidically isolated from said means for flowing gas through said chamber, for cooling said first perforated electrode.

9. Apparatus for sterilization and treatment of medical and dental devices and materials in a gas plasma comprising,

a gas-tight confining chamber,

a first liquid cooled perforated metallic electrode, said electrode being positioned within and spaced from said gas-tight confining chamber,

a second perforated metallic electrode positioned between and spaced apart from said gas-tight chamber and said first perforated electrode,

means for evacuating said chamber,

means for flowing gas through said chamber,

a liquid cooling system fluidically isolated from said means for flowing gas through said chamber, for cooling said first perforated electrode, and

means for applying an RF voltage between said second perforated electrode and said gas-confining chamber wall.

10. Apparatus in accordance with claim 9 wherein said second perforated metallic electrode is fluid cooled.

14. Apparatus in accordance with any one of claims 8, 9, 11, 12, 10 or 13 wherein said gas tight confining chamber is fluid cooled.

11. Apparatus for sterilization and treatment of medical and dental devices and materials in a gas plasma comprising,

a gas-tight confining chamber,

a first liquid cooled perforated metallic electrode positioned within and spaced from said chamber wall,

means for electrically connecting said chamber wall to a point of potential reference,

means for applying an RF voltage between said perforated electrode and said point of potential reference,

mean for evacuating said gas-confining chamber,

means for flowing gas through said chamber, and

a liquid cooling system fluidically isolated from said means for flowing gas through said chamber, for cooling said first perforated electrode.

12. Apparatus for sterilization and treatment of medical and dental devices and materials in a gas plasma comprising,

a gas-tight confining chamber formed with a metallic wall connected to a point of potential reference,

a first fluid cooled perforated metallic electrode connected to a point of potential reference, said electrode being positioned within and spaced from said gas-tight confining chamber,

a second perforated metallic electrode positioned between and spaced apart from said gas-tight chamber and said first perforated electrode,

means for evacuating said chamber,

means for flowing gas through said chamber,

a fluid cooling system fluidically isolated from said means for flowing gas through said chamber, for cooling said first perforated electrode, and

means for applying an RF voltage between said second perforated metallic electrode and said point of potential reference.

13. Apparatus in accordance with claim 12 wherein said second perforated metallic electrode is fluid cooled.

15. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials within a first metallic perforated electrode, said electrode being positioned within, and spaced from a fluid cooled gas-tight confining chamber with a wall,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said internal perforated electrode and the chamber wall, creating a gas plasma accompanied by a substantially field-free and glowless volume within the perforated electrode containing said devices and materials, whereby said devices and materials are contacted by substantially electrically neutral active species at a temperature below that which would be detrimental to said devices and materials,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber;

and

withdrawing said devices and materials from said chamber.

16. A method in accordance with claim 15 wherein said gas tight chamber is metallic and is connected to a point of potential reference.

17. A method in accordance with either of claims 15 or 16 wherein said devices and materials are enclosed within sealed pouches formed of gas permeable material while said pouches containing said materials and devices are within said chamber.

18. A method in accordance with either of claims 15 or 16 wherein said gas comprises one or more of the group of gases consisting of:

hydrogen;

oxygen;

nitrogen;

hydrogen-oxygen mixtures;

hydrogen-oxygen-inert gas mixtures;

oxygen-nitrogen mixtures;

oxygen-nitrogen-inert gas mixtures;

nitrogen-hydrogen mixtures;

nitrogen-hydrogen-inert gas mixtures;

oxygen-nitrogen-hydrogen mixtures;

oxygen-nitrogen-hydrogen-inert gas mixtures;

oxygen-helium mixtures;

oxygen-organohalogen mixtures;

oxygen-organohalogen-inert gas mixtures;

oxygen-organohalogen-nitrogen mixtures;

oxygen-inorganic halogen mixtures;

oxygen-inorganic halogen-inert gas mixtures;

oxygen-inorganic halogen-nitrogen mixtures;

oxygen-inorganic oxyhalogenated compound mixtures;

oxygen-inorganic oxyhalogenated compound-inert gas mixtures;

oxygen-inorganic oxyhalogenated compound-nitrogen mixtures, helium, argon, helium-argon mixtures.

19. A method in accordance with either of claims 15 or 16 and wherein said gas comprises water vapor in excess of 100 ppm as a constituent in a binary mixture with any one of the groups of gases consisting of oxygen, nitrogen, argon or a halogen.

20. Method according to claim 15 wherein said gas is selected from the group consisting of, an oxidizing gas, a reducing gas, and a gaseous mixture of oxygen and any one of the gases consisting of, nitrogen, argon, helium or halogen.

21. Method according to claim 20 wherein said first perforated electrode is fluid cooled.

25. A method in accordance with any one of claims 22, 20 or 21 wherein said devices and materials are enclosed within sealed pouches formed of gas permeable materials while in said chamber.

22. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials within a first fluid cooled metallic perforated electrode, said electrode being positioned within, and spaced from a gas-tight confining chamber with a wall,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

wherein said gas is selected from the group consisting of, an oxidizing gas, a reducing gas, and a gaseous mixture of oxygen and any one of the gases consisting of, nitrogen, argon, helium or halogen,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said internal perforated electrode and the chamber wall, creating a gas plasma accompanied by a substantially field-free and glowless volume within the perforated electrode containing said devices and materials, whereby said devices and materials are contacted by substantially electrically neutral active species at a temperature below that which would be detrimental to said devices and materials,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber;

and

withdrawing said devices and materials from said chamber.

24. A method in accordance with either of claims 22 or 23 wherein said gas-tight chamber is metallic and is connected to a point of potential reference.

23. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials within a first fluid cooled metallic perforated electrode, said electrode being positioned within and spaced from a gas-tight confining chamber with a wall, said chamber enclosing a fluid cooled second perforated metallic electrode positioned between and spaced apart from said gas-tight chamber and said first perforated electrode,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

wherein said gas is selected from the group consisting of, an oxidizing gas, a reducing gas, and a gaseous mixture of oxygen and any one of the gases consisting of, nitrogen, argon, helium or halogen,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said second perforated electrode and said chamber wall, creating a gas plasma accompanied by a substantially field-free and glowless volume within said first perforated electrode containing said devices and materials, whereby said devices and materials are contacted by substantially electrically neutral active species at a temperature below that which would be detrimental to said devices and materials,

maintaining said gas plasma for a controlled period of time, and

maintaining a flow of said gas through said chamber;

withdrawing said devices and material from said first perforated electrode.

27. Method in accordance with either one of claims 23 or 26 wherein said gas tight confining chamber is fluid cooled.

26. A method for sterilization and treatment of medical and dental devices and materials comprising the steps of,

placing said devices and materials on a generally planar fluid cooled metallic electrode, said electrode being positioned within a gas-tight confining chamber, said chamber being made of metal and connected to a point of potential reference, the internal surface area of said chamber being substantially larger than the surface area of said planar electrode,

further including a perforated metallic enclosure within said chamber, said perforated enclosure being insulated from, but surrounding and containing said planar electrode and said devices and materials positioned thereon, said enclosure being connected to said point of potential reference, whereby said devices and materials are contacted by a substantially electrically neutral active species at a temperature below that which would be detrimental to said devices and materials,

evacuating said chamber to a substantially low pressure and introducing a gas into said chamber,

wherein said gas is selected from the group consisting of, an oxidizing gas, a reducing gas, and a gaseous mixture of oxygen and any one of the gases consisting of, nitrogen, argon, helium or halogen,

initiating an electrical discharge in said gas within said chamber by application of an RF voltage between said planar electrode and said point of potential reference creating a gas plasma,

maintaining said gas plasma for a controlled period of time,

maintaining a flow of said gas through said chamber;

and

withdrawing said devices and materials from said chamber.