Method for monitoring the dimensions and other aspects linewidth thickness and discoloration of specular patterns

• US 5,172,420 A
• Filed: 05/11/1992
• Issued: 12/15/1992
• Est. Priority Date: 05/28/1991
• Status: Expired due to Term

• Current Assignee: AT&T, Inc.
• Original Assignee: AT&T, Inc.
• Inventors: Riese, David R., Ray, Rajarshi
• Primary Examiner(s): Boudreau, Leo H.
• Assistant Examiner(s): FOX, DAVID
• Application Number:
  US07/884,857
• Time in Patent Office: 218 Days
• Field of Search: 302/8, 302/55, 358/106, 358/107, 356/237
• US Class Current: 382/150
• CPC Class Codes: G01N 2021/95615 with stored comparision signal
• CPC Class Codes: G01N 21/95607 using a comparative method
• CPC Class Codes: G06T 2207/20036 Morphological image processing
• CPC Class Codes: G06T 2207/30148 Semiconductor; IC; Wafer
• CPC Class Codes: G06T 7/001 using an image reference approach

Abstract

Inspection of a metallized pattern (14) on a substrate (12) to monitor both the lateral dimensions and the intensity variation beyond tolerance limits is carried out by first capturing the image of the pattern with a television camera (20). The captured image is then compared to each of two models (40 and 42) comprising comparison patterns whose features have their lateral dimensions eroded and dilated, respectively, and the other aspect dilated and eroded, respectively, by a factor corresponding to the dimensional and intensity tolerances. The results of such comparison are logically combined to yield an image containing only defects (if any).

Claims

1. A method for inspecting a specular pattern on a substrate to monitor both the lateral dimensions and at least one other aspect of interest of the features in the pattern thereof, comprising the steps of:

(a) capturing the actual image of the pattern;

(b) comparing the captured image to a first model, representing an image of a comparison pattern with the value of said aspect of interest in said model dilated to a maximum allowable value and the lateral dimensions of its features eroded to a minimum allowable value;

(c) comparing the captured image to a second model, representing an image of a comparison pattern with the value of said aspect of interest in said model eroded to a minimum allowable value and the lateral dimensions of its features dilated to a maximum allowable value;

(d) logically combining the results obtained by comparing the captured image to each of the first and second models; and

(e) establishing whether the lateral dimensions and said aspect of interest of the pattern are within prescribed tolerance values in accordance with the results of the comparison.

2. The method according to claim 1 wherein said aspect of interest is the intensity of the features of the pattern.

3. The method according to claim 1 wherein the results of the comparisons are logically combined by subtracting the captured image from that of the first model, then subtracting the second model from the captured image, and adding the results of such subtractions.

4. The method according to claim 1 wherein the first model is established by the steps of:

capturing the image of a comparison pattern having features corresponding to features in the pattern on the substrate;

eroding the lateral dimensions of the features in the captured image of the comparison pattern by an amount corresponding a minimum allowable value; and

dilating the value of said aspect of interest of the features in the captured image of the comparison pattern by an amount corresponding to a maximum allowable value.

5. The method according to claim 1 wherein the second template is established by the steps of:

capturing the image of a comparison pattern having features corresponding to features in the pattern on the substrate;

dilating the lateral dimensions of the features in the captured image of the comparison pattern by an amount corresponding a maximum allowable value; and

eroding the value of said aspect of interest of the features of the captured image of the comparison pattern by an amount corresponding to a minimum allowable value.