Solid imaging system using photohardening inhibition

• US 5,175,077 A
• Filed: 07/05/1990
• Issued: 12/29/1992
• Est. Priority Date: 07/05/1990
• Status: Expired due to Fees

• Current Assignee: DSM B.V.
• Original Assignee: E. I. du Pont de Nemours and Company (Corteva, Inc.)
• Inventors: Grossa, Mario
• Primary Examiner(s): Bowers, Jr., Charles L.
• Assistant Examiner(s): Chea, Thorl
• Application Number:
  US07/562,912
• Time in Patent Office: 908 Days
• Field of Search: 430/271, 430/333, 430/269, 430/394, 430/396, 430/13, 430/15, 430/17, 430/917, 430/527, 425/162, 425/974, 425/974.4, 522/2, 264/22, 427/54.1
• US Class Current: 264/401
• CPC Class Codes: B29C 64/40 Structures for supporting 3D objects during manufacture and intended to be sacrificed after completion thereof
• CPC Class Codes: B29K 2995/0073 smooth
• CPC Class Codes: Y10S 430/118 with inhibitor or stabilizer

Abstract

An imaging method and apparatus produces a film of photohardened composition by exposing a layer of photohardenable composition to actinic radiation through a surface of a barrier transparent to the radiation and in contact with the composition at an interface therewith. An inhibition layer is created within the photohardenable composition in contact with the interface that inhibits photohardening of the composition within the inhibition layer during exposure, thereby precluding adhesion of any photohardened composition to the barrier.

Claims

1. A method for fabricating a film of photohardened composition by positioning a surface of a barrier transparent to actinic radiation in contact with a photohardenable composition to form an interface therewith and exposing a layer of the photohardenable composition to the radiation through the surface of the barrier, the improvement in the method comprising forming within the photohardenable composition an inhibition layer in contact with the interface that inhibits photohardening of the composition within the inhibition layer during the exposing step, thereby precluding adhesion of any photohardened composition to the barrier.

3. A method as recited in claim 1 or 2, further comprising the step of moving the film in a direction substantially parallel to the interface in order to form a new layer of photohardenable composition adjacent to the interface, and repeating the forming and exposing steps in order to fabricate a new film juxtaposed with the previously exposed film, thereby forming a continuous film of photohardened composition.

4. A method as recited in claim 3, wherein said exposing step is performed selectively to fabricate a patterned film, and wherein said method further comprises the step of moving the film away from the interface in a direction substantially orthogonal thereto until a new layer of photohardenable composition is formed adjacent to the interface, and then repeating the forming, exposing and moving steps in order to fabricate an integral three-dimensional object having a multiplicity of cross-sectional portions corresponding to the successive patterned films of photohardened material.

5. A method as recited in claim 4, wherein the photohardenable composition is contained within a vessel having a movable platform disposed within the composition upon which the photohardened material is supported, and wherein the moving steps are performed by successively lowering the platform away from the interface.

6. A method as recited in claim 1 or 2, wherein the photohardenable composition has a latent inhibitor of photohardening mixed in solution therewith, and wherein the creating step is performed by activating the inhibitor adjacent the interface.

7. A method as recited in claim 6, wherein the inhibitor of photohardening is reversible such that the inhibitor may be deactivated.

8. A method as recited in claim 6, wherein the activating step is performed by photoactivation.

9. A method as recited in claim 7, wherein the activating step is performed by photoactivation.

10. A method as recited in claim 6, wherein the inhibitor of photohardening is a nitroso-dimer.

11. A method as recited in claim 7, wherein the inhibitor of photohardening is a nitroso-dimer.

12. A method as defined in claim 11, wherein the nitroso-dimer is 2,3-diaza-1,4,4-trimethylbicyclo [3.2.1] oct-2-ene-N,N-dioxide.

13. A method as defined in claim 10, wherein the nitroso-dimer is 2,3-diaza-1,4,4-trimethylbicyclo [3.2.1] oct-2-ene-N,N-dioxide.

2. A method for fabricating a film from a photohardenable composition comprising the steps of:

(a) placing the photohardenable composition in contact with one of two opposite surfaces belonging to a transparent barrier, in a way to form an interface therewith, with the requirement that the other surface of the barrier remains unwetted by the composition;

(b) exposing a layer of the photohardenable composition to actinic radiation through the transparent barrier to form the film; and

(c) forming within the photohardenable composition an inhibition layer in contact with the interface that inhibits photohardening of the composition within the inhibition layer during the exposing step, thereby precluding adhesion of the film to the barrier.