Impact detector

• US 5,177,331 A
• Filed: 07/05/1991
• Issued: 01/05/1993
• Est. Priority Date: 07/05/1991
• Status: Expired due to Term

• Current Assignee: Delphi Technologies, Inc. (BorgWarner Incorporated)
• Original Assignee: Delco Electronics Corporation (Motors Liquidation Co. GUC Trust)
• Inventors: Rich, David B., Chilcott, Dan W.
• Primary Examiner(s): SCOTT, JAMES R
• Application Number:
  US07/726,099
• Time in Patent Office: 550 Days
• Field of Search: 200/61.45 R-61.53, 200/181, 73/1 D, 73/517 R
• US Class Current: 200/61.45R
• CPC Class Codes: G01P 15/135 by making use of contacts which are actuated by a movable inertial mass
• CPC Class Codes: H01H 1/0036 Switches making use of microelectromechanical systems [MEMS] for electromagnetic relays H01H50/005; for electrostatic relays H01H59/0009
• CPC Class Codes: H01H 2001/0063 having electrostatic latches, i.e. the activated position is kept by electrostatic forces other than the activation force
• CPC Class Codes: H01H 35/14 Switches operated by change of acceleration, e.g. by shock or vibration, inertia switch wherein the liquid constitutes a contact of the switch H01H29/002
• CPC Class Codes: H01H 35/142 Damping means to avoid unwanted response

Abstract

An impact detector includes a center chip of micromachined silicon, a top cap, and a back plate, with the center chip being sandwiched between the top cap and the back plate. The center chip is micromachined to provide a seismic mass, a perimeter ring, and a plurality of beams interconnecting the perimeter ring and the seismic mass. The center chip and back plate mount aligned switch contacts which close to each other when the seismic mass moves from its static or nondisplaced position to its operative or displaced position. An electrostatic attractive force is generated between the seismic mass and the back plate. This electrostatic attractive force is less than the tensile force applied to the seismic mass by the beams so that the seismic mass remains in its static or nondisplaced position unless the impact detector is subjected to an impulsive force of sufficient magnitude and duration such that the inertial reaction force of the seismic mass when coupled with the electrostatic attractive force is greater than the tensile force so that the seismic mass moves to the operative displaced position. In the operative displaced position, the electrostatic attractive force latches the switch contacts to each other until the electrostatic attractive force is reduced and the tensile force can then return the seismic mass to its static or nondisplaced position.

Claims

1. An impact detector for detecting impact of a moving object with an obstacle comprising, a seismic mass, means applying a tensile force to the seismic mass to locate the seismic mass in a static or nondisplaced position and resist movement of the seismic mass to an operative displaced position, first contact means carried by the seismic mass for movement therewith, contact support means located in spaced relationship to the first contact means, second contact means on the contact support means for closure to the first contact means upon displacement of the seismic mass to the operative displaced position, and means applying an electrostatic force between the seismic mass and the contact support means biasing the seismic mass toward the displaced position, the tensile force applied to the seismic mass being sufficient to resist movement of the seismic mass to the displaced position by the electrostatic force, the application of an impulsive force to the seismic mass coupled with the electrostatic force overcoming the resistance of the tensile force and moving the seismic mass to the displaced position wherein the electrostatic force latches the first contact means to the second contact means, and means for reducing the electrostatic force between the seismic mass and contact support means in the displaced position of the seismic mass to allow the tensile force to unlatch the first and second contact means and return the seismic mass to the static or nondisplaced position.

7. The combination recited in claim 1 wherein the seismic mass is of truncated pyramidal shape.

9. The combination recited in claim 1 wherein the seismic mass and contact support means are each provided with a contact layer and a voltage is applied between such layers to generate the electrostatic force between the seismic mass and the contact support means.

2. An impact detector for detecting impact of a moving object with an obstacle comprising, a support, a seismic mass, a plurality of beams interconnecting the support and the seismic mass applying a tensile force to the seismic mass to locate the seismic mass in a static or nondisplaced position and resist movement of the seismic mass to an operative displaced position, first contact means carried by the seismic mass for movement therewith, contact support means located in spaced relationship to the first contact means, second contact means on the contact support means for closure to the first contact means upon displacement of the seismic mass to the operative displaced position, and means applying an electrostatic force between the seismic mass and the contact support means biasing the seismic mass toward the displaced position, the tensile force applied to the seismic mass being sufficient to resist movement of the seismic mass to the displaced position by the electrostatic force, the application of an impulsive force to the seismic mass coupled with the electrostatic force overcoming the resistance of the tensile force and moving the seismic mass to the displaced position wherein the electrostatic force latches the first contact means to the second contact means, and means for reducing the electrostatic force between the seismic mass and contact support means in the displaced position of the seismic mass to allow the tensile force to unlatch the first and second contact means and return the seismic mass to the static or nondisplaced position.

3. An impact detector for detecting impact of a moving object with an obstacle comprising, a silicon wafer micromachined to provide a seismic mass, a permiter ring surrounding the seismic mass and means interconnecting the perimeter ring and seismic mass and applying a tensile force to the seismic mass to locate the seismic mass in a static or nondisplaced position and resist movement of the seismic mass to an operative displaced position, first contact means carried by the seismic mass for movement therewith, contact support means located in spaced relationship to the first contact means, second contact means on the contact support means for closure to the first contact means upon displacement of the seismic mass to the operative displaced position, and means applying an electrostatic force between the seismic mass and the contact support means biasing the seismic mass toward the displaced position, the tensile force applied to the seismic mass being sufficient to resist movement of the seismic mass to the displaced position by the electrostatic force, the application of an impulsive force to the seismic mass coupled with the electrostatic force overcoming the resistance of the tensile force and moving the seismic mass to the displaced position wherein the electrostatic force latches the first contact means to the second contact means, and means for reducing the electrostatic force between the seismic mass and contact support means in the displaced position of the seismic mass to allow the tensile force to unlatch the first and second contact means and return the seismic mass to the static or nondisplaced position.

4. An impact detector for detecting impact of a moving object with an obstacle comprising, a silicon wafer micromachined to provide a seismic mass, a perimeter ring surrounding the seismic mass and a plurality of beams interconnecting the perimeter ring and seismic mass and applying a tensile force to the seismic mass to locate the seismic mass in a static or nondisplaced position and resist movement of the seismic mass to an operative displaced position, first contact means carried by the seismic mass for movement therewith, contact support means located in spaced relationship to the first contact means, second contact means on the contact support means for closure to the first contact means upon displacement of the seismic mass to the operative displaced position, and means applying an electrostatic force between the seismic mass and the contact support means biasing the seismic mass toward the displaced position, the tensile force applied to the seismic mass being sufficient to resist movement of the seismic mass to the displaced position by the electrostatic force, the application of an impulsive force to the seismic mass coupled with the electrostatic force overcoming the resistance of the tensile force and moving the seismic mass to the displaced position wherein the electrostatic force latches the first contact means to the second contact means, and means for reducing the electrostatic force between the seismic mass and contact support means in the displaced position of the seismic mass to allow the tensile force to unlatch the first and second contact means and return the seismic mass to the static or nondisplaced position.

5. The combination recited in claim 4 wherein the beams are located in parallel spaced relationship to each other.

6. The combination recited in claim 4 wherein the beams are located in nonparallel relationship to each other.

8. The combination recited in claim 4 wherein the seismic mass is of truncated pyramidal shape and the beams are planar.