Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams

• US 5,178,974 A
• Filed: 04/10/1991
• Issued: 01/12/1993
• Est. Priority Date: 10/12/1990
• Status: Expired due to Term

• Current Assignee: Lawrence Livermore National Security LLC (Government of the United States of America)
• Original Assignee: United States Department of Energy
• Inventors: Hawryluk, Andrew M., Ceglio, Natale M.
• Primary Examiner(s): McCamish, Marion E.
• Assistant Examiner(s): Duda, Kathleen
• Application Number:
  US07/683,011
• Time in Patent Office: 643 Days
• Field of Search: 430/5, 430/394, 430/396, 355/47, 355/49, 355/52, 355/66
• US Class Current: 430/5
• CPC Class Codes: G03F 7/2002 with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
• CPC Class Codes: G03F 7/70208 Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
• CPC Class Codes: G03F 7/70233 Optical aspects of catoptric systems, i.e. comprising only reflective elements, e.g. extreme ultraviolet [EUV] projection systems
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70433 Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors

Abstract

Virtually distortion free large field high resolution imaging is performed using an imaging system which contains large field distortion or field curvature. A reticle is imaged in one direction through the optical system to form an encoded mask. The encoded mask is then imaged back through the imaging system onto a wafer positioned at the reticle position. Particle beams, including electrons, ions and neutral particles, may be used as well as electromagnetic radiation.

Claims

1. A method for substantially distortion-free imaging of a reticle onto a wafer, comprising:

imaging the reticle onto an encodable mask through a distortion producing imaging system in one direction;

patterning the reticle image onto the encodable mask to form an encoded mask;

replacing the reticle with a wafer at the same position;

imaging the encoded mask back through the distortion producing imaging system in the opposite direction onto the wafer;

wherein the steps of imaging the reticle and mask are performed using illumination beams selected from particle beams and electromagnetic radiation beams.

2. The method of claim 1 further comprising forming the imaging system with substantially no coma, astigmatism and spherical aberrations.

3. The method of claim 1 wherein the imaging system has substantial field distortion and/or field curvature.

4. The method of claim 1 wherein the step of imaging the encoded mask onto the wafer comprises directing an illumination beam reflected from or transmitted through the encoded mask back through the imaging system along the same path but in the opposite direction as the direction used to encode the mask.

5. The method of claim 1 wherein the encoded mask is flat for flat field to flat field imaging systems.

6. The method of claim 1 wherein the encoded mask is curved for flat field to curved field imaging systems.

7. The method of claim 1 further comprising imaging the reticle over a wide field of view.

8. The method of claim 1 further comprising illuminating the reticle to produce a high resolution image of the reticle on the encodable mask.

9. The method of claim 1 further comprising illuminating the encoded mask to produce a high resolution image of the mask on the wafer.