×

Etching system having simplified diffuser element removal

  • US 5,180,467 A
  • Filed: 08/10/1990
  • Issued: 01/19/1993
  • Est. Priority Date: 08/08/1990
  • Status: Expired due to Term
First Claim
Patent Images

1. A system for etching semiconductor wafers comprising:

  • an upper electrode assembly for producing a gas source, said upper electrode assembly including an upper electrode;

    a ground grid assembly mounted to the upper electrode assembly and forming an area which receives gas from said gas source; and

    a diffuser plate for diffusing said gas from said gas source into said area, said diffuser plate further including means for mounting said diffuser plate to said upper electrode assembly such that at least a portion of said diffuser plate can be removed from the wafer etching system independently of the upper electrode assembly.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×