×

Method of manufacturing an X-ray exposure mask and device for controlling the internal stress of thin films

  • US 5,188,706 A
  • Filed: 03/16/1990
  • Issued: 02/23/1993
  • Est. Priority Date: 03/18/1989
  • Status: Expired due to Fees
First Claim
Patent Images

1. A method of manufacturing an X-ray msk comprising the steps of:

  • (a) forming an X-ray transmitting thin film on a mask support;

    (b) form an X-ray absorber thin film on said X-ray transmitting thin film;

    (c) patterning said X-ray absorbe thin film with a desired pattern to from an X-ray absorber pattern; and

    (d) ion-implanting, prior to step (c), at least one inert element with an atomic number greater than that of neon in only a surface layer of said X-ray absorber thin film.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×