Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers

• US 5,190,637 A
• Filed: 04/24/1992
• Issued: 03/02/1993
• Est. Priority Date: 04/24/1992
• Status: Expired due to Term

• Current Assignee: Wisconsin Alumni Research Foundation (University of Wisconsin System)
• Original Assignee: Wisconsin Alumni Research Foundation (University of Wisconsin System)
• Inventors: Guckel, Henry
• Primary Examiner(s): TUFARIELLO, THOMAS
• Application Number:
  US07/874,116
• Time in Patent Office: 312 Days
• Field of Search: 205/118, 205/123
• US Class Current: 205/118
• CPC Class Codes: B01D 71/02 Inorganic material
• CPC Class Codes: B01D 71/0215 Silicon carbide; Silicon nitride; Silicon oxycarbide
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G03F 7/094 Multilayer resist systems, e.g. planarising layers

Abstract

Complex metal structures are formed in microminiature dimensions utilizing multiple mask exposures which are capable of producing substantially arbitrary three-dimensional shapes. A first layer of a primary metal is electroplated onto an exposed plating base to fill a void in a photoresist, the photoresist is removed, and a secondary metal, which can constitute a sacrificial metal, is electroplated over the first layer and the plating base. The exposed surface of the deposited secondary metal is then machined down to a height which exposes the first metal to produce a substantially flat, uniform surface extending across both the primary and secondary metals. The secondary metal facilitates machining of the primary and secondary metals because of these mechanical stability provided by the secondary metal to the primary metal. After the first layers of the primary and secondary metals have been machined, another photoresist layer can be applied over the primary and secondary metals, and a second layer of primary metal is electroplated. A further layer of secondary metal can be also electroplated if desired. The process of machining and electroplating can be repeated until the desired structure is formed. Secondary metal is removed by an etchant which does not etch the primary metal.

Claims

1. A method of forming micromechanical structures comprising the steps of:

(a) providing a plating base on a surface of a substrate;

(b) applying a photoresist in a layer onto the plating base;

(c) exposing the photoresist in a pattern to radiation to render the photoresist dissolvable in a pattern;

(d) removing the dissolvable photoresist;

(e) electroplating a first layer of a primary metal onto the plating base in the area from which the photoresist has been removed;

(f) removing the remainder of the photoresist;

(g) electroplating a first layer of a secondary metal onto the plating base to cover and surround the first layer of the primary metal, the secondary metal chosen so that it can be differentially etched without substantially etching the primary metal;

(h) machining the exposed surface of the secondary metal down to a flat surface to a selected height which exposes the first layer of the primary metal.

2. The method of claim 1 including the further step of applying an etchant to the primary and secondary metals which etches the secondary metal while substantially not etching the primary metal to remove the secondary metal.

3. The method of claim 1 wherein the secondary metal is electroplated to a height greater than the height of first layer of primary metal.

4. The method of claim 1 including the further steps of:

(a) applying a photoresist in a layer over the exposed first layer of primary metal and the secondary metal;

(b) exposing the photoresist to radiation in a pattern to render the photoresist dissolvable in a pattern;

(c) removing the dissolvable photoresist;

(d) electroplating a second layer of a primary metal in the area from which the photoresist has been removed to cover at least part of the exposed surface of the first layer of primary metal and to also cover part of the exposed surface of the first layer of secondary metal;

(e) removing the remainder of the photoresist;

(f) electroplating a second layer of a secondary metal over the second layer of the primary metal and over the surface of the first layer of the primary and secondary metals;

(g) machining the exposed surface of the second layer of the secondary metal down to a flat surface to a height which exposes the second layer of the primary metal.

5. The method of claim 4 including the additional step of applying an etchant to the surface of the second layers of the primary and secondary metals to differentially etch away the first and second layers of the secondary metal while substantially not etching the first and second layers of the primary metal.

6. The method of claim 4 wherein the second layer of secondary metal is deposited to a height which is greater than the height of the second layer of primary metal.

7. The method of claim 1 wherein the step of exposing the photoresist in a pattern is carried out by exposing the photoresist to X-ray synchrotron radiation through an X-ray mask to define a pattern in the photoresist and wherein the photoresist is sensitive to X-rays to be dissolvable after exposure to X-rays.

8. The method of claim 7 wherein the photoresist is polymethylmethacrylate.

9. The method of claim 1 wherein the primary metal is nickel and the secondary metal is silver.

10. The method of claim 1 wherein the step of machining is carried out utilizing a micromill.

11. The method of claim 1 wherein in the step of exposing the photoresist in a pattern the photoresist is exposed to provide two parallel areas where the photoresist can be dissolved, and wherein the electroplated primary metal formed in the area where the photoresist has been dissolved defines two parallel upright walls extending from the plating base.

12. The method of claim 11 including the further steps of:

(a) applying a photoresist in a layer over the exposed first layer of primary metal and the first layer of secondary metal;

(b) exposing the photoresist to radiation in a pattern to render the photoresist dissolvable in the pattern which extends across the two upright walls defined by the first layer of primary metal;

(c) removing the dissolvable photoresist;

(d) electroplating a second layer of primary metal in the area from which the photoresist has been removed to cover the exposed surface of the first layers of metal and to bridge the exposed surface of the secondary metal between the two upright walls formed by the first layer of primary metal;

(e) removing the remainder of the photoresist;

secondary metals to differentially etch away the first layer of the secondary metal while substantially not etching the first and second layers of the primary metal.

13. The method of claim 1 wherein the substrate includes a layer of sacrificial material onto which the plating base is applied, and including the additional step after all other steps have been completed of removing the plating base in selected areas to provide access to the sacrificial layer material and applying an etchant which etches the sacrificial layer without substantially etching the primary metal.

14. A method of forming micromechanical structures comprising the steps of:

(a) providing a plating base on a surface of a substrate;

(b) applying a photoresist in a layer onto the plating base;

(c) exposing the photoresist in a pattern to radiation to render the photoresist dissolvable in a pattern;

(d) removing the dissolvable photoresist;

(e) electroplating a first layer of a primary metal onto the plating base in the area from which the photoresist has been removed;

(f) removing the remainder of the photoresist;

(g) electroplating a first layer of a secondary metal onto the plating base to cover and surround the first layer of the primary metal, the secondary metal chosen so that it can be differentially etched without substantially etching the primary metal;

(h) machining the exposed surface of the secondary metal down to a flat surface to a selected height which exposes the first layer of the primary metal;

(i) applying a photoresist in a layer over the exposed first layer of primary metal and the first layer of secondary metal;

(j) exposing the photoresist to radiation in a pattern to render the photoresist dissolvable in a pattern;

(k) removing the dissolvable photoresist;

(l) electroplating a second layer of a primary metal in the area from which the photoresist has been removed to cover at least part of the exposed surface of the first layer of primary metal and to also cover part of the exposed surface of the first layer of secondary metal;

(m) removing the remainder of the photoresist;

(n) electroplating a second layer of a secondary metal over the second layer of the primary metal and over the surface of the first layer of the primary and secondary metals; and

surface to a height which exposes the second layer of the primary metal.

15. The method of claim 14 wherein in the steps of electroplating the first and second layers of secondary metal, the secondary metal is electroplated to a height which is greater than the height of the layer of primary metal.

16. The method of claim 14 including the additional step of applying an etchant to the surface of the second layers of the primary and secondary metals to differentially etch away the first and second layers of the secondary metal while substantially not etching the first and second layers of the primary metal.

17. The method of claim 14 wherein the step of exposing the photoresist in a pattern is carried out by exposing the photoresist to X-ray synchrotron radiation through an X-ray mask to define a pattern in the photoresist and wherein the photoresist is sensitive to X-rays to be dissolvable after exposure to X-rays.

18. The method of claim 17 wherein the photoresist is polymethylmethacrylate.

19. The method of claim 14 wherein the primary metal is nickel and the secondary metal is silver.

20. The method of claim 14 wherein the step of machining is carried out utilizing a micromill.

21. The method of claim 14 wherein the substrate includes a layer of sacrificial material onto which the plating base is applied, and including the additional step after all other steps have been completed of removing the plating base in selected areas to provide access to the sacrificial layer and applying an etchant which etches the sacrificial layer without substantially etching the primary metal.