Device for the suppression of arcs

• US 5,192,894 A
• Filed: 12/13/1991
• Issued: 03/09/1993
• Est. Priority Date: 08/20/1991
• Status: Expired due to Fees

• Current Assignee: Balzers und Leybold Deutschland Holding AG (Balzers & Leybold Group)
• Original Assignee: Leybold Aktiengesellschaft
• Inventors: Teschner, Gotz
• Primary Examiner(s): Popek, Joseph A.
• Assistant Examiner(s): YOO, DO H
• Application Number:
  US07/807,278
• Time in Patent Office: 452 Days
• Field of Search: 315/111.21, 315/111.71, 315/111.81, 313/231.31, 313/231.41, 250/426, 204/192.38, 204/298.41
• US Class Current: 315/111.21
• CPC Class Codes: H01J 2237/0206 Extinguishing, preventing or controlling unwanted discharges
• CPC Class Codes: H01J 37/34 operating with cathodic sputtering H01J37/36 takes precedence ; methods of cathodic sputtering C23C14/34
• CPC Class Codes: H01J 37/3444 Associated circuits
• CPC Class Codes: H02H 7/00 Emergency protective circuit arrangements specially adapted for specific types of electric machines or apparatus or for sectionalised protection of cable or line systems, and effecting automatic switching in the event of an undesired change from normal working conditions

Abstract

The invention relates to a circuit configuration for the suppression of arcs in a plasma wherein to the plasma path (5, 7, 8) a voltage (11) is applied. The instantaneous value of the voltage of the plasma path (5, 7, 8) is compared with a mean value of the voltage which has been determined over a given period of time. If the difference between the instantaneous value and mean value exceeds a given amount, the plasma path (5, 7, 8) is isolated from the voltage (11).

Claims

1. Circuit configuration for the suppression of arcs in a plasma wherein to a plasma path a voltage source is connected, comprising a means for sensing an instantaneous value of the voltage of the plasma path, a means for generating a mean plasma voltage determined over a given time and a means for comparing said instantaneous value of the voltage of the plasma path with the mean plasma voltage and for isolating said voltage source (11) from said plasma path if the difference between the instantaneous value of the plasma voltage and the mean plasma voltage exceeds a given value.

2. Circuit configuration as stated in claim 1, characterized in that the means for generating the mean plasma voltage determined over the given time comprises an integration element (19, 20) whose time constant is selected so that at a given lower limit value for a slope of a voltage drop and at a defined minimum length of time of the voltage drop a signal level required for the triggering of a switch isolating the voltage source (11) is reached.

3. Circuit configuration as stated in claim 2, characterized in that the mean plasma voltage from the integration element is suppled to an input of a differential amplifier (17) and the instantaneous value of the plasma voltage is applied to an other input of the differential amplifier.

4. Circuit configuration as stated in claim 3, characterized in that the output signal of the differential amplifier (17) is placed onto an input of a further differential amplifier (24) which functions as a trigger and to whose other input is provided said given value.

5. Circuit configuration as stated in claim 4, characterized in that the output of the further differential amplifier (24) is connected with the switch (9) disposed between the voltage source (11) and an electrode (6) of the plasma path.

6. Circuit configuration as stated in claim 5, characterized in that between the voltage source (11) and the switch (9) a choke (10) is connected.