High dielectric constant capacitor and method for manufacturing the same
First Claim
1. A high dielectric constant capacitor, including:
- a substrate;
a first electrode film formed on said substrate;
a first tantalum oxide film formed on said first electrode film;
a first metal oxide film formed on said first tantalum oxide film, wherein said first metal oxide film is made of a metal oxide whose valence is smaller than that of tantalum, and whose dielectric constant is equal to or greater than that of tantalum oxide;
wherein said first tantalum oxide film and said first metal oxide film together comprise a high dielectric constant film; and
a second electrode film formed on said high dielectric constant film.
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Abstract
A high dielectric constant film comprised of at least a first dual-film layer, which includes a first tantalum oxide film, and a first metal oxide film which is made of a metal oxide whose valence is smaller than that of tantalum, and whose dielectric constant is equal to or greater than that of tantalum oxide. The first metal oxide film preferably has a thickness of less than approximately 50 angstroms, in order to thereby avoid the formation of a columnar structure, which has been identified as a principal cause of the high leakage current problem which has plagued presently available high dielectric constant capacitors. The first tantalum oxide film preferably has a thickness in the range of between approximately 5 angstroms to approximately 200 angstroms, with the ratio of the thickness of the first tantalum oxide film to the thickness of the first metal oxide film being in the range of 1:10 to 100:1. The high dielectric constant film preferably further includes a plurality of additional dual-film layers formed on the first dual-film layer, to thereby provide a multilayer high dielectric constant film. Each of the additional dual-film layers is preferably of the same construction as that of the first dual-film layer.
The present invention also encompasses a high dielectric constant capacitor which incorporates the above-described high dielectric constant film, and a method for manufacturing the same.
118 Citations
30 Claims
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1. A high dielectric constant capacitor, including:
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a substrate; a first electrode film formed on said substrate; a first tantalum oxide film formed on said first electrode film; a first metal oxide film formed on said first tantalum oxide film, wherein said first metal oxide film is made of a metal oxide whose valence is smaller than that of tantalum, and whose dielectric constant is equal to or greater than that of tantalum oxide; wherein said first tantalum oxide film and said first metal oxide film together comprise a high dielectric constant film; and a second electrode film formed on said high dielectric constant film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method for manufacturing a high dielectric constant capacitor, including the steps of:
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forming a first electrode film on a substrate; forming a first tantalum oxide film on said first electrode film; forming a first metal oxide film on said first tantalum oxide film, said metal oxide film being formed of a metal oxide whose valence is smaller than that of tantalum, and whose dielectric constant is equal to or greater than that of tantalum oxide, whereby said first tantalum oxide film and said first metal oxide film together comprise a high dielectric constant film; and
,forming a second electrode film on said high dielectric constant film. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification