System and method for exhausting vapor from a heated pressure chamber

• US 5,195,048 A
• Filed: 02/26/1991
• Issued: 03/16/1993
• Est. Priority Date: 02/26/1991
• Status: Expired due to Fees

• Current Assignee: American Sterilizer Company (Steris Corporation)
• Original Assignee: American Sterilizer Company (Steris Corporation)
• Inventors: Cook, Thomas G., Geibel, Conrad J., Chiffon, Mark E.
• Primary Examiner(s): Black, Thomas G.
• Assistant Examiner(s): ZANELLI, MICHAEL J
• Application Number:
  US07/662,138
• Time in Patent Office: 749 Days
• Field of Search: 364/551.01, 364/550, 364/558, 364/509, 364/571.02, 364/571.05, 364/166, 137/2, 137/12, 422/26, 422/110, 422/112, 422/113
• US Class Current: 700/282
• CPC Class Codes: A61L 2/07 Steam
• CPC Class Codes: B01J 3/002 Component parts of these vessels not mentioned in B01J3/004, B01J3/006, B01J3/02 - B01J3/08; Measures taken in conjunction with the process to be carried out, e.g. safety measures
• CPC Class Codes: Y10T 137/0379 By fluid pressure

Abstract

A system and method of exhausting vapor, such as steam, from a pressure chamber following the sterilization phase of a sterilization cycle under superatmospheric pressure conditions are provided. The system and method preferably employ a microprocessor and an appropriate pressure transducer to measure the chamber pressure at the conclusion of the vapor exposure period to determine an initial chamber pressure. The method includes the further steps of exhausting vapor from the chamber for a period of time, preferably up to about one minute, to lower the chamber pressure, measuring the chamber pressure at the conclusion of such first period of time to determine a second chamber pressure and calculating the difference between the initial chamber pressure and the second chamber pressure to determine an exhaust rate. The exhaust rate is used to predetermine successively lower next target chamber pressures to be reached at the conclusion of successive intervals of a predetermined second period of time, such as three seconds, until a predetermined final chamber pressure is reached. Vapor is exhausted from the chamber during each successive interval of the second period of time until the target chamber pressure for that particular second period of time is reached. After each such interval of time, the chamber pressure is measured to determine whether the calculated next target chamber pressure has been reached.

Claims

1. A method for exhausting vapor from a pressure chamber for processing loads following a vapor exposure period under superatmospheric pressure conditions, said method comprising the steps of:

(a) measuring chamber pressure at the conclusion of the exposure period to determine an initial chamber pressure;

(b) exhausting vapor from the chamber for a predetermined first period of time to lower the chamber pressure;

(c) measuring chamber pressure at the conclusion of said first period of time to determine a second chamber pressure;

(d) calculating a difference between said initial chamber pressure and said second chamber pressure to determine an optimal pressure differential;

(e) calculating a difference between said second chamber pressure and said optimal pressure differential to predetermine a target chamber pressure to be reached at the conclusion of one interval of a predetermined second period of time;

(f) exhausting vapor from the chamber for said one interval of said second period of time to lower the chamber pressure to said target chamber pressure predetermined in the immediately preceding calculating step;

(g) measuring the chamber pressure during said one interval of said second period of time to determine whether said target chamber pressure has been reached;

(h) discontinuing the exhaustion of vapor from the chamber when said target chamber pressure has been reached;

(i) if said target chamber pressure has not been reached by the conclusion of said one interval of said second period of time, calculating a difference between the chamber pressure measured in step (g) and said pressure differential to predetermine a further target chamber pressure to be reached at the conclusion of an additional interval of said second period of time and repeating steps (f) through (i) to reach progressively lower chamber pressures over successive intervals of said second period of time until a predetermined final chamber pressure is reached;

or

(j) if said target chamber pressure has been reached by the conclusion of said one interval of said second period of time, calculating a difference between said target chamber pressure predetermined in step (e) and said pressure differential to predetermine a further target chamber pressure to be reached at the conclusion of an additional interval of said second period of time and repeating steps (f) through (j) to reach progressively lower chamber pressures over successive intervals of said second period of time until a predetermined final chamber pressure is reached.

2. The method recited in claim 1 wherein vapor is exhausted from the chamber in step (b) and in step (f) through a first exhaust valve until said target chamber pressure cannot be reached following exhaustion of vapor for a predetermined number of successive intervals of said second period of time, whereupon vapor is thereafter exhausted from the chamber through a second exhaust valve, said second exhaust valve being larger than said first exhaust valve.

3. The method recited in claim 2 wherein said predetermined number of successive intervals is equal to five.

4. The method recited in claim 1 further comprising the step of decreasing said optimal pressure differential by a predetermined amount and using such decreased optimal pressure differential for calculating said target chamber pressure during the remainder of the method.

5. The method recited in claim 1 wherein said vapor is steam, said load is at least one container of an aqueous solution and said first period of time is a time, up to about one minute, sufficient to establish an exhaust curve which follows a saturated steam/pressure curve suitable for the type and size of load in the chamber.

6. A system for exhausting vapor from a pressure chamber for processing loads following a vapor exposure period under superatmospheric pressure conditions, comprising:

(a) first means for measuring chamber pressure at the conclusion of the exposure period to determine an initial chamber pressure;

(b) second means for exhausting vapor from the chamber for a predetermined first period of time to lower the chamber pressure;

(c) third means for measuring chamber pressure at the conclusion of said first period of time to determine a second chamber pressure;

(d) fourth means for calculating a difference between said initial chamber pressure and said second chamber pressure to determine an optimal pressure differential;

(e) fifth means for calculating a difference between said second chamber pressure and said optimal pressure differential to predetermine a target chamber pressure to be reached at the conclusion of one interval of a predetermined second period of time;

(f) sixth means for exhausting vapor from the chamber for said one interval of said second period of time to lower the chamber pressure to said target chamber pressure;

(g) seventh means for measuring chamber pressure during said one interval of said second period of time to determine whether said target chamber pressure has been reached;

(h) eighth means for discontinuing the exhaustion of vapor from the chamber when said target chamber pressure has been reached;

(i) ninth means for calculating a difference between the chamber pressure measured during said one interval of said second period of time and said optimal pressure differential, if said target chamber pressure has not been reached by the conclusion of said one interval of said second period of time, to predetermine a further target chamber pressure to be reached at the conclusion of an additional interval of said second period of time; and

(j) tenth means for calculating a difference between said target chamber pressure and said optimal pressure differential, if said target chamber pressure has been reached by the conclusion of said one interval of said second period of time, to predetermine a further target chamber pressure to be reached at the conclusion of an additional interval of said second period of time.

7. The system of claim 6 wherein said second means for exhausting vapor includes a first exhaust valve.

8. The system of claim 7 wherein said sixth means for exhausting vapor includes said first exhaust valve and a second exhaust valve, said second exhaust valve being larger than said first exhaust valve.

9. The system of claim 6 wherein said first means for measuring chamber pressure, said third means for measuring chamber pressure and said seventh means for measuring chamber pressure include a pressure transducer and a microprocessor.

10. The system of claim 6 wherein said fourth means for calculating, said fifth means for calculating, said ninth means for calculating and said tenth means for calculating include a microprocessor.