Shadow ram cell having a shallow trench eeprom
First Claim
1. A semiconductor device memory array formed on a semiconductor substrate, comprising:
- a multiplicity of DRAM cells, each of said DRAM cells having a FET with a gate electrode and first and second diffusion regions, and a storage capacitor having first and second storage electrodes, said storage electrode being coupled to said first diffusion region of said FET;
and a multiplicity of EEPROM cells, each having a floating gate disposed in a trench in said semiconductor substrate running between respective ones of said multiplicity of DRAM cells, each of said multiplicity of EEPROM cells having a first controlled electrode connected to said first diffusion region of a respective one of said FETs of a respective one of said DRAM cells, so that a logic state stored by said storage capacitor modulates a charge region in a portion of said substrate adjacent to said floating gate to control a charge stored in said floating gate.
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Accused Products
Abstract
A semiconductor device memory array formed on a semiconductor substrate comprising a multiplicity of field effect transistor DRAM devices disposed in array is disclosed. Each of the DRAM devices is paired with a non-volatile EEPROM cell and the EEPROM cells are disposed in a shallow trench in the semiconductor substrate running between the DRAM devices such that each DRAM-EEPROM pair shares a common drain diffusion. The EEPROM cells are arranged in the trench such that there are discontinuous laterally disposed floating gate polysilicon electrodes and continuous horizontally disposed program and recall gate polysilicon electrodes. The floating gate is separated from the program and recall gates by a silicon rich nitride. The array of the invention provides high density shadow RAMs. Also disclosed are methods for the fabrication of devices of the invention.
136 Citations
35 Claims
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1. A semiconductor device memory array formed on a semiconductor substrate, comprising:
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a multiplicity of DRAM cells, each of said DRAM cells having a FET with a gate electrode and first and second diffusion regions, and a storage capacitor having first and second storage electrodes, said storage electrode being coupled to said first diffusion region of said FET; and a multiplicity of EEPROM cells, each having a floating gate disposed in a trench in said semiconductor substrate running between respective ones of said multiplicity of DRAM cells, each of said multiplicity of EEPROM cells having a first controlled electrode connected to said first diffusion region of a respective one of said FETs of a respective one of said DRAM cells, so that a logic state stored by said storage capacitor modulates a charge region in a portion of said substrate adjacent to said floating gate to control a charge stored in said floating gate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A memory cell array formed relative to a surface of a semiconductor substrate, said memory cell array comprising:
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(a) at least four rectangular trenches aligned in two parallel rows offset such that corresponding elements of said rectangular trenches fall on a diagonal line which is at about 45°
to said parallel rows, each rectangular trench containing an electrode surrounded by an insulator;(b) at least one elongated, linear trench oriented parallel to said diagonal line, said elongated trench having first and second side portions and a bottom portion; (c) at least one first electrode disposed in one of said elongated trenches such that each trench contains a first electrode, each of said first electrodes being coupled to a voltage source and each of said first electrodes having a first surface portion; (d) a plurality of second electrodes, disposed at said first side portion of one of said elongated trenches such that each second electrode is adjacent one rectangular trench on its side of said elongated trench, each of said second electrodes having a second surface portion disposed adjacent said first surface portion of a respective one of said first electrodes for receiving injected electrons therefrom, and each of said second electrodes having a third surface portion; (e) a plurality of third electrodes disposed at said second side portion of one of said elongated trenches such that each third electrode is adjacent one rectangular trench on its side of said elongated trench, each of said third electrodes having a second surface portion disposed adjacent said first surface portion of a respective one of said first electrodes for receiving injected electrons therefrom, and each of said third electrodes having a third surface portion; (f) a fourth electrode disposed at said upper portion of one of said elongated trenches, having a fourth surface portion disposed adjacent said third surface portions of respective ones of said second and third electrodes for receiving electrons injected therefrom; and (g) a diffusion region, said diffusion region being adjacent to said elongated trench and disposed between adjacent ones of said rectangular trenches, said diffusion region being coupled to a signal source. - View Dependent Claims (14, 15, 16, 17)
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18. An EEPROM memory array formed in a semiconductor substrate, said EEPROM array comprising:
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(a) a groove formed in said substrate; (b) a first continuous electrode coupled to a first voltage source; (c) a second continuous electrode coupled to a second voltage source; (d) a plurality of discontinuous electrodes; (e) an electrically insulating material separating all of said electrodes from said substrate, said first and second electrodes from each other, and said discontinuous electrodes from one another; and (f) a material that allows electrons to tunnel between said discontinuous electrodes and said first and second electrodes. - View Dependent Claims (19, 20, 21)
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22. An EEPROM cell comprising a first electrode which functions as a recall gate, a second electrode which functions as a program gate, and at least two third electrodes which function as floating gates wherein said first and second electrodes are T-shaped in cross section, said first electrode is in inverted T orientation, said second electrode is in upright T orientation, the main axes of both electrodes are aligned vertically and said two third electrodes occupy regions on opposite sides of said vertically aligned first and second electrodes within a vertical region defined by horizontal elements of said T- shaped first and second electrodes.
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23. A coupled DRAM-EEPROM circuit comprising:
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(a) an input terminal; (b) a control terminal; (c) a field effect transistor (FET) having a current channel and a control electrode for receiving a signal;
a first end of said channel being connected to said input terminal;(d) a storage capacitor having an input coupled to a second end of said channel; (e) a second FET having a control electrode for receiving a signal, a floating gate, and a current channel, a first end of said second FET current channel being coupled to said second end of said first FET channel and to said capacitor; (f) a third FET having a control electrode for receiving a signal and a current channel, a first end of said third FET channel being coupled to a second end of said second FET channel;
second end of said third FET channel being coupled to a signal node a second end of said third FET channel being coupled to said control terminal;(g) said floating gate of said second FET being capable of receiving electrons by tunneling from said third FET control electrode;
said floating gate of said second FET being capable of discharging electrons by tunneling to said second FET control electrode; and(h) said storage capacitor having a higher capacitance than a capacitive load provided by said second and third FETs. - View Dependent Claims (24, 25, 26, 27, 28)
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29. A shadow DRAM cell, comprising:
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a first FET having a gate electrode coupled to a word line and first and second controlled electrodes said first controlled electrode being coupled to a bit line; a storage capacitor having first and second electrodes, one of said electrodes of said storage capacitor being coupled to said second controlled electrode of said first FET; and a second FET having a floating gate, a first control gate disposed on said floating gate, and first and second controlled electrodes, said first controlled electrode of said second FET being coupled to said second controlled electrode of said first FET. - View Dependent Claims (30, 31)
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32. An EEPROM cell formed in a semiconductor substrate having a trench formed therein having a lower portion, an upper portion, and first and second sides, comprising:
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a first electrode formed within the bottom portion of the trench; a second electrode formed within the trench and abutting at least the first side of the trench and a portion of said first electrode for receiving electrons injected therefrom; a third electrode formed at least partially within the trench, and abutting said second electrode for receiving tunneling electrons injected therefrom, and a diffusion region extending from the surface of the substrate and abutting at least the side of the trench. - View Dependent Claims (33, 34, 35)
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Specification