Composite element having a titanium chalcogenide or oxychalcogenide layer, more particularly usable as the positive electrode in a thin film electrochemical cell
First Claim
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1. Composite element constituted by a substrate coated by cathodic sputtering of a homogeneous, continuous, compact, thin layer of an isotropic, X-ray amorphous material in accordance with the formula:
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space="preserve" listing-type="equation">TiO.sub.a X.sub.bin which X represents a sulphur, selenium or tellurium atom and a and b are such that 0.01≦
a≦
2, 0.01≦
b≦
2 and 2≦
a+b≦
3, said coating having a thickness of 200 nm to 10 μ
m, an amorphous structure and a density lower than that of crystallized TiO2 or TiS2, without surface porosity.
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Abstract
The invention relates to a composite element usable in an electrochemical generator. The element comprises a substrate (1) covered by cathodic sputtering with a layer (5) of amorphous material TiOa XB with X=S, Se or Te and
0.01<a≦2,
0.01<b≦3,
2≦a+b≦3.
The layer (5) consitutes the positive electrode of the generator and it can be associated with a lithium negative electrode (9) and a lithium ion conductive glass electrolyte (7).
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Citations
11 Claims
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1. Composite element constituted by a substrate coated by cathodic sputtering of a homogeneous, continuous, compact, thin layer of an isotropic, X-ray amorphous material in accordance with the formula:
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space="preserve" listing-type="equation">TiO.sub.a X.sub.bin which X represents a sulphur, selenium or tellurium atom and a and b are such that 0.01≦
a≦
2, 0.01≦
b≦
2 and 2≦
a+b≦
3, said coating having a thickness of 200 nm to 10 μ
m, an amorphous structure and a density lower than that of crystallized TiO2 or TiS2, without surface porosity. - View Dependent Claims (2, 3)
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4. Electrochemical cell having a positive electrode, a negative electrode able to release an alkali metal ion or proton and an ionic conductive electrolyte positioned between the two electrodes, characterized in that the positive electrode is formed by a homogenous, continuous, composite, thin coating of isotropic, X-ray-amorphous material, deposited by cathodic sputtering and in accordance with the formula:
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space="preserve" listing-type="equation">TiO.sub.a X.sub.bin which X represents S, Se or Te, and a and b are such that 0.01≦
a≦
2, 0.01≦
b≦
2 and 2≦
a+b≦
3, said coating having a thickness of 200 nm to 10 μ
m, an amorphous structure and a density lower than that of crystallized TiO2 or TiS2, without surface porosity. - View Dependent Claims (5, 6, 7, 8, 9, 10, 11)
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Specification