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Composite element having a titanium chalcogenide or oxychalcogenide layer, more particularly usable as the positive electrode in a thin film electrochemical cell

  • US 5,202,201 A
  • Filed: 05/02/1991
  • Issued: 04/13/1993
  • Est. Priority Date: 11/04/1988
  • Status: Expired due to Term
First Claim
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1. Composite element constituted by a substrate coated by cathodic sputtering of a homogeneous, continuous, compact, thin layer of an isotropic, X-ray amorphous material in accordance with the formula:

  • 
    
    space="preserve" listing-type="equation">TiO.sub.a X.sub.bin which X represents a sulphur, selenium or tellurium atom and a and b are such that 0.01≦

    a≦

    2, 0.01≦

    b≦

    2 and 2≦

    a+b≦

    3, said coating having a thickness of 200 nm to 10 μ

    m, an amorphous structure and a density lower than that of crystallized TiO2 or TiS2, without surface porosity.

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