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Method of forming a capacitor in semiconductor wafer processing

  • US 5,202,278 A
  • Filed: 09/10/1991
  • Issued: 04/13/1993
  • Est. Priority Date: 09/10/1991
  • Status: Expired due to Term
First Claim
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1. A method of forming a capacitor in semiconductor wafer processing comprising the following steps:

  • providing a conductively doped first layer of polysilicon atop a silicon wafer to a first thickness;

    depositing an undoped second layer of polysilicon over the conductively doped first layer of polysilicon to a second thickness, the layer of undoped polysilicon being deposited at a deposition temperature of at least 590° and

    having a smooth upper surface, said upper surface being smoother than upper surfaces of polysilicon layers deposited at temperatures less than 590°

    C.;

    impinging laser energy onto the upper surface of the second polysilicon layer at a laser fluence of 0.3 J/cm2 or greater to roughen the smooth upper surface and thereby increase the capacitance of the second polysilicon layer;

    patterning and etching the first and second polysilicon layers to define a lower capacitor plate;

    providing a layer of capacitor dielectric atop the roughened second polysilicon layer upper surface; and

    providing a layer of conductive material atop the capacitor dielectric to define an upper capacitor plate.

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