Method of forming a capacitor in semiconductor wafer processing
First Claim
1. A method of forming a capacitor in semiconductor wafer processing comprising the following steps:
- providing a conductively doped first layer of polysilicon atop a silicon wafer to a first thickness;
depositing an undoped second layer of polysilicon over the conductively doped first layer of polysilicon to a second thickness, the layer of undoped polysilicon being deposited at a deposition temperature of at least 590° and
having a smooth upper surface, said upper surface being smoother than upper surfaces of polysilicon layers deposited at temperatures less than 590°
C.;
impinging laser energy onto the upper surface of the second polysilicon layer at a laser fluence of 0.3 J/cm2 or greater to roughen the smooth upper surface and thereby increase the capacitance of the second polysilicon layer;
patterning and etching the first and second polysilicon layers to define a lower capacitor plate;
providing a layer of capacitor dielectric atop the roughened second polysilicon layer upper surface; and
providing a layer of conductive material atop the capacitor dielectric to define an upper capacitor plate.
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Abstract
A method of forming a capacitor in semiconductor water processing comprising the following steps: a) providing a conductively doped first layer of polysilicon atop a silicon wafer to a first thickness; b) depositing an undoped second layer of polysilicon over the conductively doped first layer of polysilicon to a second thickness, the layer of undoped polysilicon being deposited at a deposition temperature of at least 590° and having an upper surface; c) impinging laser energy onto the upper surface of the second polysilicon layer at a laser fluence of 0.3 J/cm2 or greater to roughen the upper surface and thereby increase the capacitance of the second polysilicon layer; d) patterning and etching the first and second polysilicon layers to define a lower capacitor plate; e) providing a layer of capacitor dielectric atop the roughened second polysilicon layer upper surface; and f) providing a layer of conductive material atop the capacitor dielectric to define an upper capacitor plate.
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Citations
24 Claims
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1. A method of forming a capacitor in semiconductor wafer processing comprising the following steps:
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providing a conductively doped first layer of polysilicon atop a silicon wafer to a first thickness; depositing an undoped second layer of polysilicon over the conductively doped first layer of polysilicon to a second thickness, the layer of undoped polysilicon being deposited at a deposition temperature of at least 590° and
having a smooth upper surface, said upper surface being smoother than upper surfaces of polysilicon layers deposited at temperatures less than 590°
C.;impinging laser energy onto the upper surface of the second polysilicon layer at a laser fluence of 0.3 J/cm2 or greater to roughen the smooth upper surface and thereby increase the capacitance of the second polysilicon layer; patterning and etching the first and second polysilicon layers to define a lower capacitor plate; providing a layer of capacitor dielectric atop the roughened second polysilicon layer upper surface; and providing a layer of conductive material atop the capacitor dielectric to define an upper capacitor plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A method of forming a capacitor in semiconductor wafer processing comprising the following steps:
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providing a conductively doped first layer of polysilicon atop a semiconductor wafer to a thickness from 100 Angstroms to 1000 Angstroms; depositing an undoped second layer of polysilicon over the conductively doped first layer of polysilicon to a thickness of from 500 Angstroms to 1500 Angstroms, the layer of undoped polysilicon being deposited at a deposition temperature of at least 590° and
having a smooth upper surface, said upper surface being smoother than upper surfaces of polysilicon deposited at temperatures less than 590°
C.;impinging laser energy onto the smooth upper surface of the second polysilicon layer with a XeCl excimer laser at a laser fluence of 0.5 J/cm2 or greater and with pulsed bursts of about 25 nanoseconds duration to roughen the smooth upper surface and thereby increase the capacitance of the second polysilicon layer; patterning and etching the first and second polysilicon layers to define a lower capacitor plate; providing a layer of capacitor dielectric atop the roughened second polysilicon layer upper surface; and providing a layer of conductive material atop the capacitor dielectric to define an upper capacitor plate.
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19. A method of forming a capacitor in semiconductor wafer processing comprising the following steps:
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depositing a layer of polysilicon atop a wafer to a thickness from 500 Angstroms to 1000 Angstroms and at a deposition temperature of at least 590°
C., the layer of polysilicon having a smooth upper surface, said upper surface being smoother than upper surfaces of polysilicon deposited at temperatures less than 590°
C.;impinging laser energy onto the smooth upper surface of polysilicon at a laser fluence of 0.3 J/cm2 or greater to roughen the smooth upper surface and thereby increase the capacitance of the polysilicon layer; ion implanting a conductivity enhancing material through the roughened upper polysilicon surface to impart conductivity to the polysilicon layer; patterning and etching the polysilicon layer to define a lower capacitor plate; providing a layer of capacitor dielectric atop the roughened polysilicon layer upper surface; and providing a layer of conductive material atop the capacitor dielectric to define an upper capacitor plates. - View Dependent Claims (20, 21, 22, 23, 24)
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Specification