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Resist process system

  • US 5,202,716 A
  • Filed: 06/25/1992
  • Issued: 04/13/1993
  • Est. Priority Date: 02/12/1988
  • Status: Expired due to Term
First Claim
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1. A resist process system comprising;

  • conveying means for conveying a wafer;

    a passage along which the conveying means is movable;

    a plurality of process units arranged beside the passage; and

    at least one waiting unit for temporarily keeping the wafer which is to be processed;

    wherein said waiting unit is arranged beside the passage and between the process units.

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