Method for plasma deposition on apertured substrates

• US 5,204,144 A
• Filed: 05/10/1991
• Issued: 04/20/1993
• Est. Priority Date: 05/10/1991
• Status: Expired due to Term

• Current Assignee: California Institute of Technology
• Original Assignee: Celestech, Inc. (L3Harris Technologies, Inc.)
• Inventors: Shephard, Cecil B. Jr., Cann, Gordon L., McKevitt, Frank X.
• Primary Examiner(s): Beck, Shrive
• Assistant Examiner(s): King, Roy V.
• Application Number:
  US07/698,446
• Time in Patent Office: 711 Days
• Field of Search: 427/38, 427/39, 427/249, 427/122, 427/244, 427/245, 427/569, 427/570, 427/571, 427/577, 118/723, 428/408
• US Class Current: 427/569
• CPC Class Codes: C23C 16/27 Diamond only
• CPC Class Codes: C23C 16/458 characterised by the method used for supporting substrates in the reaction chamber
• CPC Class Codes: C23C 16/4584 the substrate being rotated
• CPC Class Codes: C23C 16/513 using plasma jets

Abstract

The substrate in a plasma jet deposition system is provided with structural attributes, such as apertures and/or grooves, that facilitate efficient deposition. Groups of substrates are arranged with respect to the plasma beam in a manner which also facilitates efficient deposition. In addition to increasing the portion of the plasma beam volume which contacts the substrate surface or surfaces, it is advantageous to provide for the efficient evacuation of spent fluids away from the substrate so that fresh plasma containing the operative species can easily and continuously contact the substrate surface.

Claims

1. A method for depositing a substance comprising the steps of:

producing a plasma beam containing the constituents of said substance;

providing a substrate having a surface in the path of said beam, said substrate having at least one aperture through said surface, such that said beam deposits said substance on said surface and a portion of the beam passes through said at least one aperture.

2. The method as defined by claim 1, wherein said at least one aperture comprises a plurality of apertures.

3. The method as defined by claim 1, further comprising providing at least one groove in said substrate.

4. The method as defined by claim 3, wherein an end of said at least one groove terminates at said at least one aperture.

5. The method as defined by claim 3, wherein said at least one groove comprises a plurality of grooves having minimum depths of 2 mm.

6. The method as defined by claim 2, further comprising a plurality of grooves in said surface, at least some of said grooves terminating at said apertures.

7. The method as defined by claim 6, wherein at least some of said grooves terminate at the periphery of said surface.

8. The method as defined by claim 1, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

9. The method as defined by claim 2, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

10. A method for depositing a substance, comprising the steps of:

producing a plasma beam containing the constituents of said substance;

providing a substrate having a surface in the path of said beam; and

providing at least one groove having a minimum depth of 2 mm in said surface extending generally across said surface, such that said beam deposits said substance on said surface and a portion of said beam is directed by said at least one groove to the periphery of said surface.

11. The method as defined by claim 10, wherein said at least one groove comprises a plurality of grooves.

12. The method as defined by claim 11, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

13. A method for depositing a substance, comprising the steps of:

producing a plasma beam containing the constituents of said substance, said beam having an axis and an envelope; and

providing a plurality of substrates having surfaces generally along the envelope of the beam and generally parallel to the axis of said beam, such that constituents in the peripheral region of said beam are applied to said surfaces and said substance is deposited on said surfaces.

14. The method as defined by claim 13, wherein said beam has a generally cylindrical elongated shape.

15. The method as defined by claim 13, wherein said substrates are spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.

16. The method as defined by claim 14, wherein said substrates are spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.

17. The method as defined by claim 15, wherein, at advancing positions in the beam propagation direction, said surfaces of the substrates are at successively smaller radial distances from the axis of said beam.

18. The method as defined by claim 17, further comprising providing a further plurality of substrates within said first-mentioned plurality of substrates to obtain an annular column of said beam between said first-mentioned plurality of substrates and said further plurality of substrates.

19. The method as defined by claim 13, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

20. The method as defined by claim 14, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

21. The method as defined by claim 15, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

22. In a method for depositing a substance, comprising the steps of producing a plasma beam containing the constituents of said substance, and providing a substrate having a surface in the path of said beam;

the improvement comprising;

a substrate having at least one aperture through said surface, such that said beam deposits said substance on said surface and a portion of said beam passes through said at least one aperture.

23. The improvement as defined by claim 22, wherein said at least one aperture comprises a plurality of apertures.

24. The improvement as defined by claim 22, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

25. In a method for depositing a substance, comprising the steps of producing a plasma beam containing the constituents of said substance, and providing a substrate having a surface in the path of said beam;

the improvement comprising;

a substrate having at least one groove having a minimum depth of 2 mm in said surface extending generally across said surface, such that said beam deposits said substance on said surface and a portion of said beam is directed by said at least one groove to the periphery of said surface.

26. The improvement as defined by claim 25, wherein said at least one groove comprises a plurality of grooves having minimum depths of 2 mm.

27. The improvement as defined by claim 25, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

28. A method for depositing a substance, comprising the steps of:

producing a plasma beam having an axis and containing the constituents of said substance;

providing a plurality of substrates which cause said beam to propagate radially with respect to said axis, said substrates having surfaces generally along the envelope of said radially propagating beam, such that the constituents in the peripheral region of said radially propagating beam are applied to said surfaces and said substance is deposited on said surfaces.

29. The method as defined by claim 28, wherein said substrates comprise annular rings.

30. The method as defined by claim 28, wherein said substrates are spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.

31. The method as defined by claim 29, wherein said substrates are spaced apart so that spent fluids of said plasma beam can pass through openings between said substrate surfaces.

32. The method as defined by claim 28, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

33. The method as defined by claim 29, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.

34. The method as defined by claim 30, wherein said substance is synthetic diamond and said plasma beam contains a carbonaceous gas and hydrogen gas.